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High-rate reactive magnetron sputter deposition and characterization of metal oxide films

Olsson, Maryam LU (2000) In Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology 520.
Abstract
to be added
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author
opponent
  • Consultant Westwood, William, Think Film Consulting Company, Ottawa, Canada
publishing date
type
Thesis
publication status
published
subject
in
Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology
volume
520
pages
79 pages
publisher
Uppsala University
defense location
Uppsala University, Ångström laboratory
defense date
2000-04-05 00:09
ISSN
1104-232X
ISBN
91-554-4683-3
language
English
LU publication?
no
id
dd0a3626-9a08-4849-9093-c15be09500eb (old id 4645418)
date added to LUP
2014-09-10 13:12:58
date last changed
2016-09-19 08:44:52
@phdthesis{dd0a3626-9a08-4849-9093-c15be09500eb,
  abstract     = {to be added},
  author       = {Olsson, Maryam},
  isbn         = {91-554-4683-3},
  issn         = {1104-232X},
  language     = {eng},
  pages        = {79},
  publisher    = {Uppsala University},
  series       = {Comprehensive summaries of Uppsala dissertations from the Faculty of Science and Technology},
  title        = {High-rate reactive magnetron sputter deposition and characterization of metal oxide films},
  volume       = {520},
  year         = {2000},
}