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Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry

Kagias, Matias LU orcid ; Wang, Zhentian ; Guzenko, Vitaliy A. ; David, Christian ; Stampanoni, Marco and Jefimovs, Konstantins (2019) In Materials Science in Semiconductor Processing 92. p.73-79
Abstract

High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.

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author
; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Deep reactive ion etching, Electroplating, Grating fabrication, X-ray interferometry
in
Materials Science in Semiconductor Processing
volume
92
pages
7 pages
publisher
Elsevier
external identifiers
  • scopus:85046140154
ISSN
1369-8001
DOI
10.1016/j.mssp.2018.04.015
language
English
LU publication?
no
additional info
Publisher Copyright: © 2018 Elsevier Ltd
id
49b5ec8c-f628-48a7-9950-0a451420492c
date added to LUP
2023-11-27 09:01:42
date last changed
2024-04-24 12:39:48
@article{49b5ec8c-f628-48a7-9950-0a451420492c,
  abstract     = {{<p>High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.</p>}},
  author       = {{Kagias, Matias and Wang, Zhentian and Guzenko, Vitaliy A. and David, Christian and Stampanoni, Marco and Jefimovs, Konstantins}},
  issn         = {{1369-8001}},
  keywords     = {{Deep reactive ion etching; Electroplating; Grating fabrication; X-ray interferometry}},
  language     = {{eng}},
  month        = {{03}},
  pages        = {{73--79}},
  publisher    = {{Elsevier}},
  series       = {{Materials Science in Semiconductor Processing}},
  title        = {{Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry}},
  url          = {{http://dx.doi.org/10.1016/j.mssp.2018.04.015}},
  doi          = {{10.1016/j.mssp.2018.04.015}},
  volume       = {{92}},
  year         = {{2019}},
}