Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry
(2019) In Materials Science in Semiconductor Processing 92. p.73-79- Abstract
High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/49b5ec8c-f628-48a7-9950-0a451420492c
- author
- Kagias, Matias LU ; Wang, Zhentian ; Guzenko, Vitaliy A. ; David, Christian ; Stampanoni, Marco and Jefimovs, Konstantins
- publishing date
- 2019-03-15
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Deep reactive ion etching, Electroplating, Grating fabrication, X-ray interferometry
- in
- Materials Science in Semiconductor Processing
- volume
- 92
- pages
- 7 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:85046140154
- ISSN
- 1369-8001
- DOI
- 10.1016/j.mssp.2018.04.015
- language
- English
- LU publication?
- no
- additional info
- Publisher Copyright: © 2018 Elsevier Ltd
- id
- 49b5ec8c-f628-48a7-9950-0a451420492c
- date added to LUP
- 2023-11-27 09:01:42
- date last changed
- 2024-04-24 12:39:48
@article{49b5ec8c-f628-48a7-9950-0a451420492c, abstract = {{<p>High quality gratings are among the key elements for successful imaging with X-ray grating interferometry. Grating fabrication, specifically of absorption gratings, with high aspect ratio and large area, is a great challenge from a microfabrication point of view. In this paper the fabrication of absorption gratings by seedless electroplating of gold in high aspect ratio silicon moulds that are fabricated by deep reactive ion etching (Bosch process) is presented. We report on our latest results and discuss the possibility of reducing the grating period down to 1.3μm. In addition, the quality of the gratings is assessed by performing visibility measurements and imaging various samples on a compact in house X-ray grating interferometer.</p>}}, author = {{Kagias, Matias and Wang, Zhentian and Guzenko, Vitaliy A. and David, Christian and Stampanoni, Marco and Jefimovs, Konstantins}}, issn = {{1369-8001}}, keywords = {{Deep reactive ion etching; Electroplating; Grating fabrication; X-ray interferometry}}, language = {{eng}}, month = {{03}}, pages = {{73--79}}, publisher = {{Elsevier}}, series = {{Materials Science in Semiconductor Processing}}, title = {{Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry}}, url = {{http://dx.doi.org/10.1016/j.mssp.2018.04.015}}, doi = {{10.1016/j.mssp.2018.04.015}}, volume = {{92}}, year = {{2019}}, }