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Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation

Ng, May Ling ; Shavorskiy, Andrey ; Rameshan, Christoph ; Mikkelsen, Anders LU ; Lundgren, Edvin LU ; Preobrajenski, Alexei LU and Bluhm, Hendrik (2015) In ChemPhysChem 16(5). p.923-927
Abstract
We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h-BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h-BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h-BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.
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author
; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
boron nitride, CO, electronic properties, intercalation, monolayers
in
ChemPhysChem
volume
16
issue
5
pages
923 - 927
publisher
John Wiley & Sons Inc.
external identifiers
  • wos:000351833100003
  • scopus:84925727340
  • pmid:25712198
ISSN
1439-7641
DOI
10.1002/cphc.201500031
language
English
LU publication?
yes
id
c800ee42-1917-4031-a561-838e9dbbb95b (old id 5277728)
date added to LUP
2016-04-01 10:28:12
date last changed
2023-11-09 21:47:38
@article{c800ee42-1917-4031-a561-838e9dbbb95b,
  abstract     = {{We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h-BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h-BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h-BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.}},
  author       = {{Ng, May Ling and Shavorskiy, Andrey and Rameshan, Christoph and Mikkelsen, Anders and Lundgren, Edvin and Preobrajenski, Alexei and Bluhm, Hendrik}},
  issn         = {{1439-7641}},
  keywords     = {{boron nitride; CO; electronic properties; intercalation; monolayers}},
  language     = {{eng}},
  number       = {{5}},
  pages        = {{923--927}},
  publisher    = {{John Wiley & Sons Inc.}},
  series       = {{ChemPhysChem}},
  title        = {{Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation}},
  url          = {{http://dx.doi.org/10.1002/cphc.201500031}},
  doi          = {{10.1002/cphc.201500031}},
  volume       = {{16}},
  year         = {{2015}},
}