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Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation

Ng, May Ling; Shavorskiy, Andrey; Rameshan, Christoph; Mikkelsen, Anders LU ; Lundgren, Edvin LU ; Preobrajenski, Alexei LU and Bluhm, Hendrik (2015) In ChemPhysChem 16(5). p.923-927
Abstract
We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h-BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h-BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h-BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
boron nitride, CO, electronic properties, intercalation, monolayers
in
ChemPhysChem
volume
16
issue
5
pages
923 - 927
publisher
John Wiley & Sons
external identifiers
  • wos:000351833100003
  • scopus:84925727340
ISSN
1439-7641
DOI
10.1002/cphc.201500031
language
English
LU publication?
yes
id
c800ee42-1917-4031-a561-838e9dbbb95b (old id 5277728)
date added to LUP
2015-04-24 09:19:15
date last changed
2017-04-23 03:12:07
@article{c800ee42-1917-4031-a561-838e9dbbb95b,
  abstract     = {We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h-BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h-BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h-BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.},
  author       = {Ng, May Ling and Shavorskiy, Andrey and Rameshan, Christoph and Mikkelsen, Anders and Lundgren, Edvin and Preobrajenski, Alexei and Bluhm, Hendrik},
  issn         = {1439-7641},
  keyword      = {boron nitride,CO,electronic properties,intercalation,monolayers},
  language     = {eng},
  number       = {5},
  pages        = {923--927},
  publisher    = {John Wiley & Sons},
  series       = {ChemPhysChem},
  title        = {Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation},
  url          = {http://dx.doi.org/10.1002/cphc.201500031},
  volume       = {16},
  year         = {2015},
}