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On the use of multilayer Laue lenses with X-ray free electron lasers

Prasciolu, Mauro ; Murray, Kevin T. ; Ivanov, Nikolay ; Fleckenstein, Holger ; Domaracký, Martin ; Gelisio, Luca ; Trost, Fabian ; Ayyer, Kartik ; Krebs, Dietrich and Aplin, Steve , et al. (2021) International Conference on X-Ray Lasers 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11886.
Abstract

We report on the use of multilayer Laue lenses to focus the intense X-ray Free Electron Laser (XFEL) beam at the European XFEL to a spot size of a few tens of nanometers. We present the procedure to align and characterize these lenses and discuss challenges working with the pulse trains from this unique X-ray source.

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author
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organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Multilayer Laue lenses, Optics, X-rays, XFEL
host publication
International Conference on X-Ray Lasers 2020
series title
Proceedings of SPIE - The International Society for Optical Engineering
editor
Bleiner, Davide
volume
11886
article number
118860M
publisher
SPIE
conference name
International Conference on X-Ray Lasers 2020
conference location
Virtual, Online
conference dates
2020-12-08 - 2020-12-10
external identifiers
  • scopus:85121599205
ISSN
1996-756X
0277-786X
ISBN
9781510646186
DOI
10.1117/12.2592229
language
English
LU publication?
yes
additional info
Publisher Copyright: © 2021 COPYRIGHT SPIE.
id
54ff510d-458a-4ac3-8514-1e857ad5b3e1
date added to LUP
2022-01-30 12:34:43
date last changed
2024-04-20 19:43:53
@inproceedings{54ff510d-458a-4ac3-8514-1e857ad5b3e1,
  abstract     = {{<p>We report on the use of multilayer Laue lenses to focus the intense X-ray Free Electron Laser (XFEL) beam at the European XFEL to a spot size of a few tens of nanometers. We present the procedure to align and characterize these lenses and discuss challenges working with the pulse trains from this unique X-ray source. </p>}},
  author       = {{Prasciolu, Mauro and Murray, Kevin T. and Ivanov, Nikolay and Fleckenstein, Holger and Domaracký, Martin and Gelisio, Luca and Trost, Fabian and Ayyer, Kartik and Krebs, Dietrich and Aplin, Steve and Awel, Salah and Boesenberg, Ulrike and Belšak, Grega and Barty, Anton and Estillore, Armando D. and Fuchs, Matthias and Gevorkov, Yaroslav and Hallmann, Joerg and Kim, Chan and Knoška, Juraj and Küpper, Jochen and Li, Chufeng and Lu, Wei and Mariani, Valerio and Morgan, Andrew J. and Möller, Johannes and Madsen, Anders and Oberthür, Dominik and Murillo, Gisel E.Peña and Reis, David A. and Scholz, Markus and Šarler, Bozidar and Villanueva-Perez, Pablo and Yefanov, Oleksandr and Zielinski, Kara A. and Zozulya, Alexey and Chapman, Henry N. and Bajt, Saša}},
  booktitle    = {{International Conference on X-Ray Lasers 2020}},
  editor       = {{Bleiner, Davide}},
  isbn         = {{9781510646186}},
  issn         = {{1996-756X}},
  keywords     = {{Multilayer Laue lenses; Optics; X-rays; XFEL}},
  language     = {{eng}},
  publisher    = {{SPIE}},
  series       = {{Proceedings of SPIE - The International Society for Optical Engineering}},
  title        = {{On the use of multilayer Laue lenses with X-ray free electron lasers}},
  url          = {{http://dx.doi.org/10.1117/12.2592229}},
  doi          = {{10.1117/12.2592229}},
  volume       = {{11886}},
  year         = {{2021}},
}