On the use of multilayer Laue lenses with X-ray free electron lasers
(2021) International Conference on X-Ray Lasers 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11886.- Abstract
We report on the use of multilayer Laue lenses to focus the intense X-ray Free Electron Laser (XFEL) beam at the European XFEL to a spot size of a few tens of nanometers. We present the procedure to align and characterize these lenses and discuss challenges working with the pulse trains from this unique X-ray source.
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https://lup.lub.lu.se/record/54ff510d-458a-4ac3-8514-1e857ad5b3e1
- author
- organization
- publishing date
- 2021
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- Multilayer Laue lenses, Optics, X-rays, XFEL
- host publication
- International Conference on X-Ray Lasers 2020
- series title
- Proceedings of SPIE - The International Society for Optical Engineering
- editor
- Bleiner, Davide
- volume
- 11886
- article number
- 118860M
- publisher
- SPIE
- conference name
- International Conference on X-Ray Lasers 2020
- conference location
- Virtual, Online
- conference dates
- 2020-12-08 - 2020-12-10
- external identifiers
-
- scopus:85121599205
- ISSN
- 0277-786X
- 1996-756X
- ISBN
- 9781510646186
- DOI
- 10.1117/12.2592229
- language
- English
- LU publication?
- yes
- additional info
- Publisher Copyright: © 2021 COPYRIGHT SPIE.
- id
- 54ff510d-458a-4ac3-8514-1e857ad5b3e1
- date added to LUP
- 2022-01-30 12:34:43
- date last changed
- 2025-03-10 02:06:23
@inproceedings{54ff510d-458a-4ac3-8514-1e857ad5b3e1, abstract = {{<p>We report on the use of multilayer Laue lenses to focus the intense X-ray Free Electron Laser (XFEL) beam at the European XFEL to a spot size of a few tens of nanometers. We present the procedure to align and characterize these lenses and discuss challenges working with the pulse trains from this unique X-ray source. </p>}}, author = {{Prasciolu, Mauro and Murray, Kevin T. and Ivanov, Nikolay and Fleckenstein, Holger and Domaracký, Martin and Gelisio, Luca and Trost, Fabian and Ayyer, Kartik and Krebs, Dietrich and Aplin, Steve and Awel, Salah and Boesenberg, Ulrike and Belšak, Grega and Barty, Anton and Estillore, Armando D. and Fuchs, Matthias and Gevorkov, Yaroslav and Hallmann, Joerg and Kim, Chan and Knoška, Juraj and Küpper, Jochen and Li, Chufeng and Lu, Wei and Mariani, Valerio and Morgan, Andrew J. and Möller, Johannes and Madsen, Anders and Oberthür, Dominik and Murillo, Gisel E.Peña and Reis, David A. and Scholz, Markus and Šarler, Bozidar and Villanueva-Perez, Pablo and Yefanov, Oleksandr and Zielinski, Kara A. and Zozulya, Alexey and Chapman, Henry N. and Bajt, Saša}}, booktitle = {{International Conference on X-Ray Lasers 2020}}, editor = {{Bleiner, Davide}}, isbn = {{9781510646186}}, issn = {{0277-786X}}, keywords = {{Multilayer Laue lenses; Optics; X-rays; XFEL}}, language = {{eng}}, publisher = {{SPIE}}, series = {{Proceedings of SPIE - The International Society for Optical Engineering}}, title = {{On the use of multilayer Laue lenses with X-ray free electron lasers}}, url = {{http://dx.doi.org/10.1117/12.2592229}}, doi = {{10.1117/12.2592229}}, volume = {{11886}}, year = {{2021}}, }