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Nanoimprint lithography: opportunities and applications

Montelius, Lars LU (2002) Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference p.18-19
Abstract
In the first part of this presentation I will highlight the understanding about nanoimprint lithography (NIL) we have developed within the two EU projects that I have been privileged to coordinate, NANOTECH and CHANIL. In the second part I will concentrate on various applications that has been successfully implemented using NIL and the concerns related to NIL for applications. This will include fabrication of electronic devices such as three terminal ballistic devices, position sensitive radiation detectors, biosensors, high frequency nanoelectromechanical systems, development of materials and patterns to increase bio-compatability and lab-on-a-chip implementations allowing, for example, in-vitro studies of controlled motion of motor... (More)
In the first part of this presentation I will highlight the understanding about nanoimprint lithography (NIL) we have developed within the two EU projects that I have been privileged to coordinate, NANOTECH and CHANIL. In the second part I will concentrate on various applications that has been successfully implemented using NIL and the concerns related to NIL for applications. This will include fabrication of electronic devices such as three terminal ballistic devices, position sensitive radiation detectors, biosensors, high frequency nanoelectromechanical systems, development of materials and patterns to increase bio-compatability and lab-on-a-chip implementations allowing, for example, in-vitro studies of controlled motion of motor proteins. Then, finally in I will give conclude my talk and give some outlooks and prospects for the implementation of NIL in various application areas (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
nanoimprint lithography
host publication
Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.02EX589)
pages
18 - 19
publisher
Japan Soc. Appl. Phys
conference name
Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference
conference location
Tokyo, Japan
conference dates
2002-11-06 - 2002-11-08
external identifiers
  • scopus:84960395437
ISBN
4-89114-031-3
DOI
10.1109/IMNC.2002.1178522
language
English
LU publication?
yes
id
fa03c5aa-e83e-434d-b202-14d1bd48e626 (old id 610911)
date added to LUP
2016-04-04 10:46:35
date last changed
2020-01-12 21:17:11
@inproceedings{fa03c5aa-e83e-434d-b202-14d1bd48e626,
  abstract     = {In the first part of this presentation I will highlight the understanding about nanoimprint lithography (NIL) we have developed within the two EU projects that I have been privileged to coordinate, NANOTECH and CHANIL. In the second part I will concentrate on various applications that has been successfully implemented using NIL and the concerns related to NIL for applications. This will include fabrication of electronic devices such as three terminal ballistic devices, position sensitive radiation detectors, biosensors, high frequency nanoelectromechanical systems, development of materials and patterns to increase bio-compatability and lab-on-a-chip implementations allowing, for example, in-vitro studies of controlled motion of motor proteins. Then, finally in I will give conclude my talk and give some outlooks and prospects for the implementation of NIL in various application areas},
  author       = {Montelius, Lars},
  booktitle    = {Digest of Papers. Microprocesses and Nanotechnology 2002. 2002 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.02EX589)},
  isbn         = {4-89114-031-3},
  language     = {eng},
  pages        = {18--19},
  publisher    = {Japan Soc. Appl. Phys},
  title        = {Nanoimprint lithography: opportunities and applications},
  url          = {http://dx.doi.org/10.1109/IMNC.2002.1178522},
  doi          = {10.1109/IMNC.2002.1178522},
  year         = {2002},
}