UV exposure : A novel processing method to fabricate nanowire solar cells
Zhang, Yuwei LU ; Chen, Yang LU ; Hrachowina, Lukas LU ; Sundvall, Christian ; Aberg, Ingvar and Borgstrom, Magnus LU
(2019)
46th IEEE Photovoltaic Specialists Conference, PVSC 2019
In Conference Record of the IEEE Photovoltaic Specialists Conference
p.2646-2648
- Abstract
We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/62f0fd59-f9a8-407d-9b69-cd6592476a5b
- author
- Zhang, Yuwei
LU
; Chen, Yang
LU
; Hrachowina, Lukas
LU
; Sundvall, Christian
; Aberg, Ingvar
and Borgstrom, Magnus
LU
- organization
- publishing date
- 2019
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- Indium phosphide, Nanowires, Photovoltaic cells
- host publication
- 2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019
- series title
- Conference Record of the IEEE Photovoltaic Specialists Conference
- article number
- 8980764
- pages
- 3 pages
- publisher
- IEEE - Institute of Electrical and Electronics Engineers Inc.
- conference name
- 46th IEEE Photovoltaic Specialists Conference, PVSC 2019
- conference location
- Chicago, United States
- conference dates
- 2019-06-16 - 2019-06-21
- external identifiers
-
- scopus:85081557184
- ISSN
- 0160-8371
- ISBN
- 9781728104942
- DOI
- 10.1109/PVSC40753.2019.8980764
- language
- English
- LU publication?
- yes
- id
- 62f0fd59-f9a8-407d-9b69-cd6592476a5b
- date added to LUP
- 2020-03-30 13:23:10
- date last changed
- 2025-10-14 13:14:44
@inproceedings{62f0fd59-f9a8-407d-9b69-cd6592476a5b,
abstract = {{<p>We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.</p>}},
author = {{Zhang, Yuwei and Chen, Yang and Hrachowina, Lukas and Sundvall, Christian and Aberg, Ingvar and Borgstrom, Magnus}},
booktitle = {{2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019}},
isbn = {{9781728104942}},
issn = {{0160-8371}},
keywords = {{Indium phosphide; Nanowires; Photovoltaic cells}},
language = {{eng}},
pages = {{2646--2648}},
publisher = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
series = {{Conference Record of the IEEE Photovoltaic Specialists Conference}},
title = {{UV exposure : A novel processing method to fabricate nanowire solar cells}},
url = {{http://dx.doi.org/10.1109/PVSC40753.2019.8980764}},
doi = {{10.1109/PVSC40753.2019.8980764}},
year = {{2019}},
}