Skip to main content

Lund University Publications

LUND UNIVERSITY LIBRARIES

UV exposure : A novel processing method to fabricate nanowire solar cells

Zhang, Yuwei LU ; Chen, Yang LU ; Hrachowina, Lukas LU ; Sundvall, Christian ; Aberg, Ingvar and Borgstrom, Magnus LU (2019) 46th IEEE Photovoltaic Specialists Conference, PVSC 2019 In Conference Record of the IEEE Photovoltaic Specialists Conference p.2646-2648
Abstract

We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.

Please use this url to cite or link to this publication:
author
; ; ; ; and
organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Indium phosphide, Nanowires, Photovoltaic cells
host publication
2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019
series title
Conference Record of the IEEE Photovoltaic Specialists Conference
article number
8980764
pages
3 pages
publisher
IEEE - Institute of Electrical and Electronics Engineers Inc.
conference name
46th IEEE Photovoltaic Specialists Conference, PVSC 2019
conference location
Chicago, United States
conference dates
2019-06-16 - 2019-06-21
external identifiers
  • scopus:85081557184
ISSN
0160-8371
ISBN
9781728104942
DOI
10.1109/PVSC40753.2019.8980764
language
English
LU publication?
yes
id
62f0fd59-f9a8-407d-9b69-cd6592476a5b
date added to LUP
2020-03-30 13:23:10
date last changed
2023-11-20 02:57:48
@inproceedings{62f0fd59-f9a8-407d-9b69-cd6592476a5b,
  abstract     = {{<p>We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.</p>}},
  author       = {{Zhang, Yuwei and Chen, Yang and Hrachowina, Lukas and Sundvall, Christian and Aberg, Ingvar and Borgstrom, Magnus}},
  booktitle    = {{2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019}},
  isbn         = {{9781728104942}},
  issn         = {{0160-8371}},
  keywords     = {{Indium phosphide; Nanowires; Photovoltaic cells}},
  language     = {{eng}},
  pages        = {{2646--2648}},
  publisher    = {{IEEE - Institute of Electrical and Electronics Engineers Inc.}},
  series       = {{Conference Record of the IEEE Photovoltaic Specialists Conference}},
  title        = {{UV exposure : A novel processing method to fabricate nanowire solar cells}},
  url          = {{http://dx.doi.org/10.1109/PVSC40753.2019.8980764}},
  doi          = {{10.1109/PVSC40753.2019.8980764}},
  year         = {{2019}},
}