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Perovskite-Compatible Electron-Beam-Lithography Process Based on Nonpolar Solvents for Single-Nanowire Devices

Lamers, Nils LU ; Zhang, Zhaojun LU and Wallentin, Jesper LU (2022) In ACS Applied Nano Materials 5(3). p.3177-3182
Abstract

Metal halide perovskites (MHPs) have been studied intensely as the active material for optoelectronic devices. Lithography methods for perovskites remain limited because of the solubility of perovskites in polar solvents. Here, we demonstrate an electron-beam-lithography process with a poly(methyl methacrylate) resist based on the nonpolar solvents o-xylene, hexane, and toluene. Features down to 50 nm size are created, and photoluminescence of CsPbBr3 nanowires exhibits no degradation. We fabricate metal contacts to single CsPbBr3 nanowires, which show a strong photoresponsivity of 0.29 A W-1. The presented method is an excellent tool for nanoscale MHP science and technology, allowing for the fabrication of complex nanostructures.

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author
; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
CsPbBr, electron-beam lithography, nanowire, patterning, perovskite
in
ACS Applied Nano Materials
volume
5
issue
3
pages
6 pages
publisher
The American Chemical Society (ACS)
external identifiers
  • scopus:85125646996
  • pmid:35372798
ISSN
2574-0970
DOI
10.1021/acsanm.2c00188
language
English
LU publication?
yes
additional info
Publisher Copyright: © 2022 The Authors. Published by American Chemical Society.
id
6a02ab52-0910-443d-8fa6-d4214257ce87
date added to LUP
2022-03-17 12:33:49
date last changed
2024-06-13 11:31:04
@article{6a02ab52-0910-443d-8fa6-d4214257ce87,
  abstract     = {{<p>Metal halide perovskites (MHPs) have been studied intensely as the active material for optoelectronic devices. Lithography methods for perovskites remain limited because of the solubility of perovskites in polar solvents. Here, we demonstrate an electron-beam-lithography process with a poly(methyl methacrylate) resist based on the nonpolar solvents o-xylene, hexane, and toluene. Features down to 50 nm size are created, and photoluminescence of CsPbBr3 nanowires exhibits no degradation. We fabricate metal contacts to single CsPbBr3 nanowires, which show a strong photoresponsivity of 0.29 A W-1. The presented method is an excellent tool for nanoscale MHP science and technology, allowing for the fabrication of complex nanostructures.</p>}},
  author       = {{Lamers, Nils and Zhang, Zhaojun and Wallentin, Jesper}},
  issn         = {{2574-0970}},
  keywords     = {{CsPbBr; electron-beam lithography; nanowire; patterning; perovskite}},
  language     = {{eng}},
  month        = {{03}},
  number       = {{3}},
  pages        = {{3177--3182}},
  publisher    = {{The American Chemical Society (ACS)}},
  series       = {{ACS Applied Nano Materials}},
  title        = {{Perovskite-Compatible Electron-Beam-Lithography Process Based on Nonpolar Solvents for Single-Nanowire Devices}},
  url          = {{http://dx.doi.org/10.1021/acsanm.2c00188}},
  doi          = {{10.1021/acsanm.2c00188}},
  volume       = {{5}},
  year         = {{2022}},
}