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Nanoplasma Formation by High Intensity Hard X-rays.

Tachibana, T; Jurek, Z; Fukuzawa, H; Motomura, K; Nagaya, K; Wada, S; Johnsson, Per LU ; Siano, M; Mondal, S and Ito, Y, et al. (2015) In Scientific Reports 5.
Abstract
Using electron spectroscopy, we have investigated nanoplasma formation from noble gas clusters exposed to high-intensity hard-x-ray pulses at ~5 keV. Our experiment was carried out at the SPring-8 Angstrom Compact free electron LAser (SACLA) facility in Japan. Dedicated theoretical simulations were performed with the molecular dynamics tool XMDYN. We found that in this unprecedented wavelength regime nanoplasma formation is a highly indirect process. In the argon clusters investigated, nanoplasma is mainly formed through secondary electron cascading initiated by slow Auger electrons. Energy is distributed within the sample entirely through Auger processes and secondary electron cascading following photoabsorption, as in the hard x-ray... (More)
Using electron spectroscopy, we have investigated nanoplasma formation from noble gas clusters exposed to high-intensity hard-x-ray pulses at ~5 keV. Our experiment was carried out at the SPring-8 Angstrom Compact free electron LAser (SACLA) facility in Japan. Dedicated theoretical simulations were performed with the molecular dynamics tool XMDYN. We found that in this unprecedented wavelength regime nanoplasma formation is a highly indirect process. In the argon clusters investigated, nanoplasma is mainly formed through secondary electron cascading initiated by slow Auger electrons. Energy is distributed within the sample entirely through Auger processes and secondary electron cascading following photoabsorption, as in the hard x-ray regime there is no direct energy transfer from the field to the plasma. This plasma formation mechanism is specific to the hard-x-ray regime and may, thus, also be important for XFEL-based molecular imaging studies. In xenon clusters, photo- and Auger electrons contribute more significantly to the nanoplasma formation. Good agreement between experiment and simulations validates our modelling approach. This has wide-ranging implications for our ability to quantitatively predict the behavior of complex molecular systems irradiated by high-intensity hard x-rays. (Less)
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published
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Scientific Reports
volume
5
publisher
Nature Publishing Group
external identifiers
  • wos:000356512800001
  • pmid:26077863
  • scopus:84935847687
ISSN
2045-2322
DOI
10.1038/srep10977
language
English
LU publication?
yes
id
c3682244-3c66-48e2-9da9-e73d7c725bc0 (old id 7476685)
date added to LUP
2015-07-23 12:52:14
date last changed
2017-10-22 04:21:27
@article{c3682244-3c66-48e2-9da9-e73d7c725bc0,
  abstract     = {Using electron spectroscopy, we have investigated nanoplasma formation from noble gas clusters exposed to high-intensity hard-x-ray pulses at ~5 keV. Our experiment was carried out at the SPring-8 Angstrom Compact free electron LAser (SACLA) facility in Japan. Dedicated theoretical simulations were performed with the molecular dynamics tool XMDYN. We found that in this unprecedented wavelength regime nanoplasma formation is a highly indirect process. In the argon clusters investigated, nanoplasma is mainly formed through secondary electron cascading initiated by slow Auger electrons. Energy is distributed within the sample entirely through Auger processes and secondary electron cascading following photoabsorption, as in the hard x-ray regime there is no direct energy transfer from the field to the plasma. This plasma formation mechanism is specific to the hard-x-ray regime and may, thus, also be important for XFEL-based molecular imaging studies. In xenon clusters, photo- and Auger electrons contribute more significantly to the nanoplasma formation. Good agreement between experiment and simulations validates our modelling approach. This has wide-ranging implications for our ability to quantitatively predict the behavior of complex molecular systems irradiated by high-intensity hard x-rays.},
  articleno    = {10977},
  author       = {Tachibana, T and Jurek, Z and Fukuzawa, H and Motomura, K and Nagaya, K and Wada, S and Johnsson, Per and Siano, M and Mondal, S and Ito, Y and Kimura, M and Sakai, T and Matsunami, K and Hayashita, H and Kajikawa, J and Liu, X-J and Robert, E and Miron, C and Feifel, R and Marangos, J P and Tono, K and Inubushi, Y and Yabashi, M and Son, S-K and Ziaja, B and Yao, M and Santra, R and Ueda, K},
  issn         = {2045-2322},
  language     = {eng},
  publisher    = {Nature Publishing Group},
  series       = {Scientific Reports},
  title        = {Nanoplasma Formation by High Intensity Hard X-rays.},
  url          = {http://dx.doi.org/10.1038/srep10977},
  volume       = {5},
  year         = {2015},
}