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Dielectric properties of pulsed-laser deposited indium tin oxide thin films

Giusti, G. ; Bowen, J. ; Ramasse, Q. ; Rey, G. ; Blackburn, E. LU ; Tian, L. ; Jones, I.p. and Abell, J.s. (2012) In Thin Solid Films 524. p.249-256
Please use this url to cite or link to this publication:
author
; ; ; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
subject
in
Thin Solid Films
volume
524
pages
249 - 256
publisher
Elsevier
external identifiers
  • scopus:84869493590
ISSN
0040-6090
DOI
10.1016/j.tsf.2012.09.053
language
English
LU publication?
no
id
77365281-a9ac-4baa-ab79-d5c34eee507d
alternative location
https://linkinghub.elsevier.com/retrieve/pii/S0040609012011935
date added to LUP
2019-01-17 11:19:33
date last changed
2020-01-13 01:22:17
@article{77365281-a9ac-4baa-ab79-d5c34eee507d,
  author       = {Giusti, G. and Bowen, J. and Ramasse, Q. and Rey, G. and Blackburn, E. and Tian, L. and Jones, I.p. and Abell, J.s.},
  issn         = {0040-6090},
  language     = {eng},
  month        = {12},
  pages        = {249--256},
  publisher    = {Elsevier},
  series       = {Thin Solid Films},
  title        = {Dielectric properties of pulsed-laser deposited indium tin oxide thin films},
  url          = {http://dx.doi.org/10.1016/j.tsf.2012.09.053},
  doi          = {10.1016/j.tsf.2012.09.053},
  volume       = {524},
  year         = {2012},
}