Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures
(2006) 14th Intl Symp “Nanostructures: Physics and Technology”, 2006
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/963152
- author
- organization
- publishing date
- 2006
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
- conference name
- 14th Intl Symp “Nanostructures: Physics and Technology”, 2006
- conference location
- St Petersburg, Russian Federation
- conference dates
- 2006-06-25 - 2006-06-30
- language
- English
- LU publication?
- yes
- id
- 982781bc-6d67-4298-a556-e3ba803be84c (old id 963152)
- date added to LUP
- 2016-04-04 14:03:40
- date last changed
- 2018-11-21 21:18:02
@inproceedings{982781bc-6d67-4298-a556-e3ba803be84c, author = {{Luo, Gang and Maximov, Ivan and Ghatnekar-Nilsson, Sara and Adolph, David and Graczyk, Mariusz and Carlberg, Patrick and Hessman, Dan and Zhu, T and Liu, Z F and Xu, Hongqi and Montelius, Lars}}, booktitle = {{Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)}}, language = {{eng}}, title = {{Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures}}, year = {{2006}}, }