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Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

Luo, Gang LU ; Maximov, Ivan LU ; Ghatnekar-Nilsson, Sara LU ; Adolph, David LU ; Graczyk, Mariusz LU ; Carlberg, Patrick LU ; Hessman, Dan LU ; Zhu, T; Liu, Z F and Xu, Hongqi LU , et al. (2006) 14th Intl Symp “Nanostructures: Physics and Technology”, 2006 In Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
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Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
conference name
14th Intl Symp “Nanostructures: Physics and Technology”, 2006
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English
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yes
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982781bc-6d67-4298-a556-e3ba803be84c (old id 963152)
date added to LUP
2008-01-28 16:38:18
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2016-06-21 10:54:02
@inproceedings{982781bc-6d67-4298-a556-e3ba803be84c,
  author       = {Luo, Gang and Maximov, Ivan and Ghatnekar-Nilsson, Sara and Adolph, David and Graczyk, Mariusz and Carlberg, Patrick and Hessman, Dan and Zhu, T and Liu, Z F and Xu, Hongqi and Montelius, Lars},
  booktitle    = {Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)},
  language     = {eng},
  title        = {Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures},
  year         = {2006},
}