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Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures

Luo, Gang LU ; Maximov, Ivan LU ; Ghatnekar-Nilsson, Sara LU ; Adolph, David LU ; Graczyk, Mariusz LU ; Carlberg, Patrick LU ; Hessman, Dan LU ; Zhu, T ; Liu, Z F and Xu, Hongqi LU , et al. (2006) 14th Intl Symp “Nanostructures: Physics and Technology”, 2006
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organization
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
host publication
Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)
conference name
14th Intl Symp “Nanostructures: Physics and Technology”, 2006
conference location
St Petersburg, Russian Federation
conference dates
2006-06-25 - 2006-06-30
language
English
LU publication?
yes
id
982781bc-6d67-4298-a556-e3ba803be84c (old id 963152)
date added to LUP
2016-04-04 14:03:40
date last changed
2018-11-21 21:18:02
@inproceedings{982781bc-6d67-4298-a556-e3ba803be84c,
  author       = {{Luo, Gang and Maximov, Ivan and Ghatnekar-Nilsson, Sara and Adolph, David and Graczyk, Mariusz and Carlberg, Patrick and Hessman, Dan and Zhu, T and Liu, Z F and Xu, Hongqi and Montelius, Lars}},
  booktitle    = {{Book of extended abstracts: 14th Intl Symp “Nanostructures: Physics and Technology”, St Petersburg, Russia (2006)}},
  language     = {{eng}},
  title        = {{Nanoimprint and reactive etching for fabrication of Si/SiO2 NEMS structures}},
  year         = {{2006}},
}