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Investigation of PMMA resist residues using photoelectron microscopy

Maximov, Ivan LU ; Zakharov, Alexei LU ; Holmqvist, T.; Montelius, Lars LU and Lindau, Ingolf LU (2002) In Journal of Vacuum Science and Technology B20(3). p.1139-1142
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organization
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Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology
volume
B20
issue
3
pages
1139 - 1142
language
English
LU publication?
yes
id
08404429-2adb-489f-b281-2549e35fb8cc (old id 974538)
date added to LUP
2012-05-30 20:30:26
date last changed
2016-04-16 10:49:02
@article{08404429-2adb-489f-b281-2549e35fb8cc,
  author       = {Maximov, Ivan and Zakharov, Alexei and Holmqvist, T. and Montelius, Lars and Lindau, Ingolf},
  language     = {eng},
  number       = {3},
  pages        = {1139--1142},
  series       = {Journal of Vacuum Science and Technology},
  title        = {Investigation of PMMA resist residues using photoelectron microscopy},
  volume       = {B20},
  year         = {2002},
}