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Investigation of PMMA resist residues using photoelectron microscopy

Maximov, Ivan LU ; Zakharov, Alexei LU ; Holmqvist, T. ; Montelius, Lars LU and Lindau, Ingolf LU (2002) In Journal of Vacuum Science and Technology B20(3). p.1139-1142
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author
; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology
volume
B20
issue
3
pages
1139 - 1142
language
English
LU publication?
yes
id
08404429-2adb-489f-b281-2549e35fb8cc (old id 974538)
date added to LUP
2016-04-04 13:05:35
date last changed
2018-11-21 21:12:09
@article{08404429-2adb-489f-b281-2549e35fb8cc,
  author       = {{Maximov, Ivan and Zakharov, Alexei and Holmqvist, T. and Montelius, Lars and Lindau, Ingolf}},
  language     = {{eng}},
  number       = {{3}},
  pages        = {{1139--1142}},
  series       = {{Journal of Vacuum Science and Technology}},
  title        = {{Investigation of PMMA resist residues using photoelectron microscopy}},
  volume       = {{B20}},
  year         = {{2002}},
}