Mesoporous Silica Sputter-Coated onto ITO : Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores
(2012) In Electroanalysis 24(6). p.1296-1305- Abstract
"Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)64- in aqueous KNO3 strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/a338f734-7b18-4a04-98f3-173006c63599
- author
- Vuorema, Anne ; Sillanpää, Mika ; Edler, Karen J. LU ; Jaber, Robben ; Dale, Sara E.C. ; Bending, Simon ; Gu, Yunfeng ; Yunus, Kamran ; Fisher, Adrian C. and Marken, Frank
- publishing date
- 2012-06
- type
- Contribution to journal
- publication status
- published
- keywords
- Electrodeposition, Gold, Membrane, Membrane sensor, Poly-electrolyte, Silica, Sputter-coating, Tin-doped indium oxide, Voltammetry
- in
- Electroanalysis
- volume
- 24
- issue
- 6
- pages
- 10 pages
- publisher
- John Wiley & Sons Inc.
- external identifiers
-
- scopus:84861859518
- ISSN
- 1040-0397
- DOI
- 10.1002/elan.201200141
- language
- English
- LU publication?
- no
- id
- a338f734-7b18-4a04-98f3-173006c63599
- date added to LUP
- 2023-05-04 18:53:10
- date last changed
- 2023-06-08 12:35:16
@article{a338f734-7b18-4a04-98f3-173006c63599, abstract = {{<p>"Simple" silica films of 50nm and 100nm thickness are sputter-coated onto ITO substrates and shown to be structured with in-planed features of ca. 15nm and pores <5nm (based on GISAXS). In electrochemical measurements membrane pore effects are observed. The oxidation current for Fe(CN)<sub>6</sub><sup>4-</sup> in aqueous KNO<sub>3</sub> strongly depends on the electrolyte concentration. Poly-cationic poly(diallyl-dimethylammonium) (PDDA) cannot enter these pores, but is adsorbed onto the outer surface of the silica film. During gold electrodeposition, PDDA causes growth of "discs". Gold deposits adhere well and a comparison of glucose electrooxidation activity reveals significant improvements.</p>}}, author = {{Vuorema, Anne and Sillanpää, Mika and Edler, Karen J. and Jaber, Robben and Dale, Sara E.C. and Bending, Simon and Gu, Yunfeng and Yunus, Kamran and Fisher, Adrian C. and Marken, Frank}}, issn = {{1040-0397}}, keywords = {{Electrodeposition; Gold; Membrane; Membrane sensor; Poly-electrolyte; Silica; Sputter-coating; Tin-doped indium oxide; Voltammetry}}, language = {{eng}}, number = {{6}}, pages = {{1296--1305}}, publisher = {{John Wiley & Sons Inc.}}, series = {{Electroanalysis}}, title = {{Mesoporous Silica Sputter-Coated onto ITO : Electrochemical Processes, Ion Permeability, and Gold Deposition Through NanoPores}}, url = {{http://dx.doi.org/10.1002/elan.201200141}}, doi = {{10.1002/elan.201200141}}, volume = {{24}}, year = {{2012}}, }