Polarization dependence of light intensity distribution near a nanometric aluminum slit
Wei, CH ; Tsao, PH ; Farm, W ; Wei, PK ; Tegenfeldt, Jonas LU
and Austin, RH
(2004)
In Optical Society of America. Journal B: Optical Physics
21(5).
p.1005-1012
- Abstract
- The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes. (C) 2004 Optical Society of America.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/279309
- author
- Wei, CH
; Tsao, PH
; Farm, W
; Wei, PK
; Tegenfeldt, Jonas
LU
and Austin, RH
- organization
- publishing date
- 2004
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Optical Society of America. Journal B: Optical Physics
- volume
- 21
- issue
- 5
- pages
- 1005 - 1012
- publisher
- Optical Society of America
- external identifiers
-
- wos:000221234800018
- scopus:10044294969
- ISSN
- 0740-3224
- language
- English
- LU publication?
- yes
- id
- a365c475-2500-4d97-a2c1-a06d35b711ea (old id 279309)
- alternative location
- http://www.opticsinfobase.org/abstract.cfm?URI=josab-21-5-1005
- date added to LUP
- 2016-04-01 15:19:18
- date last changed
- 2022-01-28 04:48:39
@article{a365c475-2500-4d97-a2c1-a06d35b711ea,
abstract = {{The near-field radiation pattern of a long thin slit (with a width much smaller than the excitation wavelength) in a uniform aluminum surface was measured and modeled by numerical computation. In particular, the interplay between the incident light polarization and the slit width is found to play an essential role in the near-field profile on the back side of the nanoslits. Two-dimensional finite-difference time-domain computer simulations were performed to calculate the near-field intensity profile for different slit widths and metal thicknesses. This method will allow the optimization of three-dimensional near-field radiation patterns for a variety of near-field molecular scanning schemes. (C) 2004 Optical Society of America.}},
author = {{Wei, CH and Tsao, PH and Farm, W and Wei, PK and Tegenfeldt, Jonas and Austin, RH}},
issn = {{0740-3224}},
language = {{eng}},
number = {{5}},
pages = {{1005--1012}},
publisher = {{Optical Society of America}},
series = {{Optical Society of America. Journal B: Optical Physics}},
title = {{Polarization dependence of light intensity distribution near a nanometric aluminum slit}},
url = {{http://www.opticsinfobase.org/abstract.cfm?URI=josab-21-5-1005}},
volume = {{21}},
year = {{2004}},
}