High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
(2017) In Microelectronic Engineering 176. p.6-10- Abstract
Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280 °C) metal alloy foils and silicon etched templates. A gold-tin alloy (80 wt% Au/20 wt% Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to20 μm and depth of the structures up to 80 μm. The metal filling of the silicon template strongly depends on the wetting properties of the liquid metal on the groove surface. A thin metal wetting layer (20 nm of Ir or Au) was deposited before the casting in order to turn the template surface into hydrophilic with respect of the melted metal alloy. Temperature and... (More)
Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280 °C) metal alloy foils and silicon etched templates. A gold-tin alloy (80 wt% Au/20 wt% Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to20 μm and depth of the structures up to 80 μm. The metal filling of the silicon template strongly depends on the wetting properties of the liquid metal on the groove surface. A thin metal wetting layer (20 nm of Ir or Au) was deposited before the casting in order to turn the template surface into hydrophilic with respect of the melted metal alloy. Temperature and pressure of the hot embossing process were optimized for a complete filling of the cavities in a low viscosity regime of the liquid metal, and for minimizing the shear force that might damage the silicon structures for small pitch grating. The new method has relevant advantages, such as being a low cost technique, fast and easily scalable to large area fabrication.
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- author
- Romano, L. ; Vila-Comamala, J. ; Kagias, M. LU ; Vogelsang, K. ; Schift, H. ; Stampanoni, M. and Jefimovs, K.
- publishing date
- 2017-05-25
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Au80Sn20 eutectic alloy, High aspect ratio gratings, Hot embossing, Metal gratings, Microcasting, Nanoimprint, X-ray optics
- in
- Microelectronic Engineering
- volume
- 176
- pages
- 5 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:85008426271
- ISSN
- 0167-9317
- DOI
- 10.1016/j.mee.2016.12.032
- language
- English
- LU publication?
- no
- additional info
- Publisher Copyright: © 2017 Elsevier B.V.
- id
- a9c317d9-c526-40b5-939f-4a3fa040ecf7
- date added to LUP
- 2023-11-27 09:07:13
- date last changed
- 2023-11-29 11:37:30
@article{a9c317d9-c526-40b5-939f-4a3fa040ecf7,
abstract = {{<p>Metal microstructured optical elements for grating-based X-ray phase-contrast interferometry were fabricated by using an innovative approach of microcasting: hot embossing technology with low melting temperature (280 °C) metal alloy foils and silicon etched templates. A gold-tin alloy (80 wt% Au/20 wt% Sn) was used to cast micro-gratings with pitch sizes in the range of 2 to20 μm and depth of the structures up to 80 μm. The metal filling of the silicon template strongly depends on the wetting properties of the liquid metal on the groove surface. A thin metal wetting layer (20 nm of Ir or Au) was deposited before the casting in order to turn the template surface into hydrophilic with respect of the melted metal alloy. Temperature and pressure of the hot embossing process were optimized for a complete filling of the cavities in a low viscosity regime of the liquid metal, and for minimizing the shear force that might damage the silicon structures for small pitch grating. The new method has relevant advantages, such as being a low cost technique, fast and easily scalable to large area fabrication.</p>}},
author = {{Romano, L. and Vila-Comamala, J. and Kagias, M. and Vogelsang, K. and Schift, H. and Stampanoni, M. and Jefimovs, K.}},
issn = {{0167-9317}},
keywords = {{Au80Sn20 eutectic alloy; High aspect ratio gratings; Hot embossing; Metal gratings; Microcasting; Nanoimprint; X-ray optics}},
language = {{eng}},
month = {{05}},
pages = {{6--10}},
publisher = {{Elsevier}},
series = {{Microelectronic Engineering}},
title = {{High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication}},
url = {{http://dx.doi.org/10.1016/j.mee.2016.12.032}},
doi = {{10.1016/j.mee.2016.12.032}},
volume = {{176}},
year = {{2017}},
}