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Operation of the european FEL at Elettra below 190 nm : A tunable laser source for VUV spectroscopy

Curbis, F. LU ; Allaria, E. ; Danailov, M. ; De Ninno, G. ; Diviacco, B. ; Marsi, M. ; Trovò, M. ; Coreno, M. ; Günster, S. and Ristau, D. (2005) 27th International Free Electron Laser Conference, FEL 2005 p.473-475
Abstract

Thanks to an intensive technological effort in the framework of the EUFELE collaboration, the European FEL at ELETTRA was able to break the previous record for the shortest wavelength of an FEL oscillator. Novel solutions were adopted for multilayer mirrors to allow FEL operation in the wavelength region between 160 and 190 nm, which is one of the main targets of the project. The characteristics of the FEL pulses measured at 176 nm (spectral profiles, high intensity, meV bandpass, MHz repetition rate) make it a competitive light source for spectroscopy, in particular for fluorescence and Raman studies in the VUV spectral range. Proof of principle experiments have been performed on different types of silica glasses, yielding information... (More)

Thanks to an intensive technological effort in the framework of the EUFELE collaboration, the European FEL at ELETTRA was able to break the previous record for the shortest wavelength of an FEL oscillator. Novel solutions were adopted for multilayer mirrors to allow FEL operation in the wavelength region between 160 and 190 nm, which is one of the main targets of the project. The characteristics of the FEL pulses measured at 176 nm (spectral profiles, high intensity, meV bandpass, MHz repetition rate) make it a competitive light source for spectroscopy, in particular for fluorescence and Raman studies in the VUV spectral range. Proof of principle experiments have been performed on different types of silica glasses, yielding information on the mechanisms of light absorption in this material.

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publishing date
type
Contribution to conference
publication status
published
pages
3 pages
conference name
27th International Free Electron Laser Conference, FEL 2005
conference location
Palo Alto, CA, United States
conference dates
2005-08-21 - 2005-08-26
external identifiers
  • scopus:84884635129
language
English
LU publication?
no
id
c3c02fe5-f9ff-4abc-b4cc-a38f6eaa2c8f
date added to LUP
2020-01-08 09:57:57
date last changed
2020-01-14 11:08:08
@misc{c3c02fe5-f9ff-4abc-b4cc-a38f6eaa2c8f,
  abstract     = {<p>Thanks to an intensive technological effort in the framework of the EUFELE collaboration, the European FEL at ELETTRA was able to break the previous record for the shortest wavelength of an FEL oscillator. Novel solutions were adopted for multilayer mirrors to allow FEL operation in the wavelength region between 160 and 190 nm, which is one of the main targets of the project. The characteristics of the FEL pulses measured at 176 nm (spectral profiles, high intensity, meV bandpass, MHz repetition rate) make it a competitive light source for spectroscopy, in particular for fluorescence and Raman studies in the VUV spectral range. Proof of principle experiments have been performed on different types of silica glasses, yielding information on the mechanisms of light absorption in this material.</p>},
  author       = {Curbis, F. and Allaria, E. and Danailov, M. and De Ninno, G. and Diviacco, B. and Marsi, M. and Trovò, M. and Coreno, M. and Günster, S. and Ristau, D.},
  language     = {eng},
  month        = {12},
  pages        = {473--475},
  title        = {Operation of the european FEL at Elettra below 190 nm : A tunable laser source for VUV spectroscopy},
  year         = {2005},
}