Formation of mesostructured thin films at the air-liquid interface
(2013) In Chemical Society Reviews 42(9). p.3765-3776- Abstract
The growth of free-standing surfactant-templated films of inorganic oxides at the air-solution interface is an attractive route to manufacture unsupported mesostructured membranes for a range of potential applications. So far this synthesis method has been relatively neglected due to the fragility of the initial films. More recent work to understand the mechanism of formation has led to development of thicker, more robust films, as well as providing new information on the general formation mechanisms of mesoporous materials whether in film or particulate form. This review describes the properties of silica and other inorganic oxide films templated by surfactants and grown at the air-solution interface, their formation mechanisms and... (More)
The growth of free-standing surfactant-templated films of inorganic oxides at the air-solution interface is an attractive route to manufacture unsupported mesostructured membranes for a range of potential applications. So far this synthesis method has been relatively neglected due to the fragility of the initial films. More recent work to understand the mechanism of formation has led to development of thicker, more robust films, as well as providing new information on the general formation mechanisms of mesoporous materials whether in film or particulate form. This review describes the properties of silica and other inorganic oxide films templated by surfactants and grown at the air-solution interface, their formation mechanisms and implications for further development of these materials.
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- author
- Edler, Karen J. LU and Yang, B.
- publishing date
- 2013-04-15
- type
- Contribution to journal
- publication status
- published
- in
- Chemical Society Reviews
- volume
- 42
- issue
- 9
- pages
- 12 pages
- publisher
- Royal Society of Chemistry
- external identifiers
-
- scopus:84875603185
- pmid:23090013
- ISSN
- 0306-0012
- DOI
- 10.1039/c2cs35300h
- language
- English
- LU publication?
- no
- id
- cd33a2d2-076b-48ae-b5dd-1007f41bf526
- date added to LUP
- 2023-03-30 09:03:53
- date last changed
- 2024-05-16 23:16:23
@article{cd33a2d2-076b-48ae-b5dd-1007f41bf526, abstract = {{<p>The growth of free-standing surfactant-templated films of inorganic oxides at the air-solution interface is an attractive route to manufacture unsupported mesostructured membranes for a range of potential applications. So far this synthesis method has been relatively neglected due to the fragility of the initial films. More recent work to understand the mechanism of formation has led to development of thicker, more robust films, as well as providing new information on the general formation mechanisms of mesoporous materials whether in film or particulate form. This review describes the properties of silica and other inorganic oxide films templated by surfactants and grown at the air-solution interface, their formation mechanisms and implications for further development of these materials.</p>}}, author = {{Edler, Karen J. and Yang, B.}}, issn = {{0306-0012}}, language = {{eng}}, month = {{04}}, number = {{9}}, pages = {{3765--3776}}, publisher = {{Royal Society of Chemistry}}, series = {{Chemical Society Reviews}}, title = {{Formation of mesostructured thin films at the air-liquid interface}}, url = {{http://dx.doi.org/10.1039/c2cs35300h}}, doi = {{10.1039/c2cs35300h}}, volume = {{42}}, year = {{2013}}, }