Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium
(2018) In Microelectronic Engineering 192. p.19-24- Abstract
X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/d30bae2a-6327-4136-aab7-56b157f09720
- author
- Vila-Comamala, Joan ; Romano, Lucia ; Guzenko, Vitaliy ; Kagias, Matias LU ; Stampanoni, Marco and Jefimovs, Konstantins
- publishing date
- 2018-05-15
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Atomic layer deposition of iridium, Deep reactive ion etching of silicon, Grating-based X-ray interferometry
- in
- Microelectronic Engineering
- volume
- 192
- pages
- 6 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:85041529942
- ISSN
- 0167-9317
- DOI
- 10.1016/j.mee.2018.01.027
- language
- English
- LU publication?
- no
- additional info
- Publisher Copyright: © 2018 Elsevier B.V.
- id
- d30bae2a-6327-4136-aab7-56b157f09720
- date added to LUP
- 2023-11-27 09:02:17
- date last changed
- 2023-11-29 11:37:30
@article{d30bae2a-6327-4136-aab7-56b157f09720, abstract = {{<p>X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.</p>}}, author = {{Vila-Comamala, Joan and Romano, Lucia and Guzenko, Vitaliy and Kagias, Matias and Stampanoni, Marco and Jefimovs, Konstantins}}, issn = {{0167-9317}}, keywords = {{Atomic layer deposition of iridium; Deep reactive ion etching of silicon; Grating-based X-ray interferometry}}, language = {{eng}}, month = {{05}}, pages = {{19--24}}, publisher = {{Elsevier}}, series = {{Microelectronic Engineering}}, title = {{Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium}}, url = {{http://dx.doi.org/10.1016/j.mee.2018.01.027}}, doi = {{10.1016/j.mee.2018.01.027}}, volume = {{192}}, year = {{2018}}, }