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Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium

Vila-Comamala, Joan ; Romano, Lucia ; Guzenko, Vitaliy ; Kagias, Matias LU ; Stampanoni, Marco and Jefimovs, Konstantins (2018) In Microelectronic Engineering 192. p.19-24
Abstract

X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.

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author
; ; ; ; and
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Atomic layer deposition of iridium, Deep reactive ion etching of silicon, Grating-based X-ray interferometry
in
Microelectronic Engineering
volume
192
pages
6 pages
publisher
Elsevier
external identifiers
  • scopus:85041529942
ISSN
0167-9317
DOI
10.1016/j.mee.2018.01.027
language
English
LU publication?
no
additional info
Publisher Copyright: © 2018 Elsevier B.V.
id
d30bae2a-6327-4136-aab7-56b157f09720
date added to LUP
2023-11-27 09:02:17
date last changed
2023-11-29 11:37:30
@article{d30bae2a-6327-4136-aab7-56b157f09720,
  abstract     = {{<p>X-ray grating interferometry is an excellent technique for X-ray phase contrast imaging and X-ray wavefront sensing with applications in materials science, biology and medical diagnosis. Among other requirements, the method depends on the availability of highly X-ray absorbing metallic gratings. Here, we report on the fabrication and characterization of high aspect ratio iridium gratings with a period of 1 μm and a depth of 30 μm combining deep reactive ion etching of silicon and atomic layer deposition of iridium. The implementation of such structures can greatly enhance the sensitivity of grating-based X-ray phase contrast imaging and thus, expand further its broad range of applications.</p>}},
  author       = {{Vila-Comamala, Joan and Romano, Lucia and Guzenko, Vitaliy and Kagias, Matias and Stampanoni, Marco and Jefimovs, Konstantins}},
  issn         = {{0167-9317}},
  keywords     = {{Atomic layer deposition of iridium; Deep reactive ion etching of silicon; Grating-based X-ray interferometry}},
  language     = {{eng}},
  month        = {{05}},
  pages        = {{19--24}},
  publisher    = {{Elsevier}},
  series       = {{Microelectronic Engineering}},
  title        = {{Towards sub-micrometer high aspect ratio X-ray gratings by atomic layer deposition of iridium}},
  url          = {{http://dx.doi.org/10.1016/j.mee.2018.01.027}},
  doi          = {{10.1016/j.mee.2018.01.027}},
  volume       = {{192}},
  year         = {{2018}},
}