Studies of electron diffusion in photo-excited Ni using time-resolved X-ray diffraction
Persson, A. I H LU ; Jarnac, A. LU ; Wang, Xiaocui LU ; Enquist, H. LU
; Jurgilaitis, A.
LU
and Larsson, Jörgen
LU
(2016)
In Applied Physics Letters
109(20).
- Abstract
We show that the heat deposition profile in a laser-excited metal can be determined by time-resolved X-ray diffraction. In this study, we investigated the electron diffusion in a 150 nm thick nickel film deposited on an indium antimonide substrate. A strain wave that mimics the heat deposition profile is generated in the metal and propagates into the InSb, where it influences the temporal profile of X-rays diffracted from InSb. We found that the strain pulse significantly deviated from a simple exponential profile, and that the two-temperature model was needed to reproduce the measured heat deposition profile. Experimental results were compared to simulations based on the two-temperature model carried out using commercial finite-element... (More)
We show that the heat deposition profile in a laser-excited metal can be determined by time-resolved X-ray diffraction. In this study, we investigated the electron diffusion in a 150 nm thick nickel film deposited on an indium antimonide substrate. A strain wave that mimics the heat deposition profile is generated in the metal and propagates into the InSb, where it influences the temporal profile of X-rays diffracted from InSb. We found that the strain pulse significantly deviated from a simple exponential profile, and that the two-temperature model was needed to reproduce the measured heat deposition profile. Experimental results were compared to simulations based on the two-temperature model carried out using commercial finite-element software packages and on-line dynamical diffraction tools. To reproduce the experimental data, the electron-phonon coupling factor was lowered compared to previously measured values. The experiment was carried out at a third-generation synchrotron radiation source using a high-brightness beam and an ultrafast X-ray streak camera with a temporal resolution of 3 ps.
(Less)
- author
- Persson, A. I H
LU
; Jarnac, A.
LU
; Wang, Xiaocui
LU
; Enquist, H.
LU
; Jurgilaitis, A.
LU
and Larsson, Jörgen
LU
- organization
- publishing date
- 2016-11-14
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Applied Physics Letters
- volume
- 109
- issue
- 20
- article number
- 203115
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- wos:000388000000056
- scopus:84998979377
- ISSN
- 0003-6951
- DOI
- 10.1063/1.4967470
- language
- English
- LU publication?
- yes
- id
- dc3e308b-dcbd-4604-a6a5-f3100b2abee1
- date added to LUP
- 2016-12-19 13:10:28
- date last changed
- 2025-10-28 03:16:52
@article{dc3e308b-dcbd-4604-a6a5-f3100b2abee1,
abstract = {{<p>We show that the heat deposition profile in a laser-excited metal can be determined by time-resolved X-ray diffraction. In this study, we investigated the electron diffusion in a 150 nm thick nickel film deposited on an indium antimonide substrate. A strain wave that mimics the heat deposition profile is generated in the metal and propagates into the InSb, where it influences the temporal profile of X-rays diffracted from InSb. We found that the strain pulse significantly deviated from a simple exponential profile, and that the two-temperature model was needed to reproduce the measured heat deposition profile. Experimental results were compared to simulations based on the two-temperature model carried out using commercial finite-element software packages and on-line dynamical diffraction tools. To reproduce the experimental data, the electron-phonon coupling factor was lowered compared to previously measured values. The experiment was carried out at a third-generation synchrotron radiation source using a high-brightness beam and an ultrafast X-ray streak camera with a temporal resolution of 3 ps.</p>}},
author = {{Persson, A. I H and Jarnac, A. and Wang, Xiaocui and Enquist, H. and Jurgilaitis, A. and Larsson, Jörgen}},
issn = {{0003-6951}},
language = {{eng}},
month = {{11}},
number = {{20}},
publisher = {{American Institute of Physics (AIP)}},
series = {{Applied Physics Letters}},
title = {{Studies of electron diffusion in photo-excited Ni using time-resolved X-ray diffraction}},
url = {{http://dx.doi.org/10.1063/1.4967470}},
doi = {{10.1063/1.4967470}},
volume = {{109}},
year = {{2016}},
}