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Interference in the angular distribution of photoelectrons in superimposed XUV and optical laser fields

Duesterer, S. ; Rading, Linnea LU ; Johnsson, Per LU orcid ; Rouzee, A. ; Hundertmark, A. ; Vrakking, M. J. J. ; Radcliffe, P. ; Meyer, M. ; Kazansky, A. K. and Kabachnik, N. M. (2013) In Journal of Physics B: Atomic, Molecular and Optical Physics 46(16).
Abstract
The angular distribution of photoelectrons ejected during the ionization of Ne atoms by extreme ultraviolet (XUV) free-electron laser radiation in the presence of an intense near infrared (NIR) dressing field was investigated experimentally and theoretically. A highly nonlinear process with absorption and emission of more than ten NIR photons results in the formation of numerous sidebands. The amplitude of the sidebands varies strongly with the emission angle and the angular distribution pattern reveals clear signatures of interferences between the different angular momenta for the outgoing electron in the multi-photon process. As a specific feature, the central photoelectron line is characterized at the highest NIR fields by an angular... (More)
The angular distribution of photoelectrons ejected during the ionization of Ne atoms by extreme ultraviolet (XUV) free-electron laser radiation in the presence of an intense near infrared (NIR) dressing field was investigated experimentally and theoretically. A highly nonlinear process with absorption and emission of more than ten NIR photons results in the formation of numerous sidebands. The amplitude of the sidebands varies strongly with the emission angle and the angular distribution pattern reveals clear signatures of interferences between the different angular momenta for the outgoing electron in the multi-photon process. As a specific feature, the central photoelectron line is characterized at the highest NIR fields by an angular distribution, which is peaked perpendicularly to both the XUV and NIR polarization directions. Experimental results are reproduced by a theoretical model based on the strong field approximation. (Less)
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organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Physics B: Atomic, Molecular and Optical Physics
volume
46
issue
16
article number
164026
publisher
IOP Publishing
external identifiers
  • wos:000323113100027
  • scopus:84883158592
ISSN
0953-4075
DOI
10.1088/0953-4075/46/16/164026
language
English
LU publication?
yes
id
ea09510a-a2c1-4994-96a6-45b25ed13cf4 (old id 4172285)
date added to LUP
2016-04-01 12:55:14
date last changed
2022-01-27 08:18:14
@article{ea09510a-a2c1-4994-96a6-45b25ed13cf4,
  abstract     = {{The angular distribution of photoelectrons ejected during the ionization of Ne atoms by extreme ultraviolet (XUV) free-electron laser radiation in the presence of an intense near infrared (NIR) dressing field was investigated experimentally and theoretically. A highly nonlinear process with absorption and emission of more than ten NIR photons results in the formation of numerous sidebands. The amplitude of the sidebands varies strongly with the emission angle and the angular distribution pattern reveals clear signatures of interferences between the different angular momenta for the outgoing electron in the multi-photon process. As a specific feature, the central photoelectron line is characterized at the highest NIR fields by an angular distribution, which is peaked perpendicularly to both the XUV and NIR polarization directions. Experimental results are reproduced by a theoretical model based on the strong field approximation.}},
  author       = {{Duesterer, S. and Rading, Linnea and Johnsson, Per and Rouzee, A. and Hundertmark, A. and Vrakking, M. J. J. and Radcliffe, P. and Meyer, M. and Kazansky, A. K. and Kabachnik, N. M.}},
  issn         = {{0953-4075}},
  language     = {{eng}},
  number       = {{16}},
  publisher    = {{IOP Publishing}},
  series       = {{Journal of Physics B: Atomic, Molecular and Optical Physics}},
  title        = {{Interference in the angular distribution of photoelectrons in superimposed XUV and optical laser fields}},
  url          = {{http://dx.doi.org/10.1088/0953-4075/46/16/164026}},
  doi          = {{10.1088/0953-4075/46/16/164026}},
  volume       = {{46}},
  year         = {{2013}},
}