Chemical vapor deposition of ordered TiOx nanostructures on Au(111)
(2013) In Surface Science 617. p.211-217- Abstract
- The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high... (More)
- The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high enough (500 degrees C). The ordered structure exhibits a LEED pattern characteristic for a rectangular surface unit cell. By performing the deposition at different temperatures it is possible to tune the balance between the 2D and 3D phases: Growth at 500 degrees C significantly favors the formation of 3D TiO2 islands as compared to growth at 200 degrees C and 300 degrees C. (C) 2013 Elsevier B.V. All rights reserved. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/4212706
- author
- Ragazzon, D. ; Schaefer, A. ; Farstad, M. H. ; Walle, L. E. ; Palmgren, P. ; Borg, A. ; Uvdal, Per LU and Sandell, A.
- organization
- publishing date
- 2013
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Titanium dioxide, Gold, Chemical vapor deposition, Synchrotron radiation, photoelectron spectroscopy, Low-energy electron diffraction, Scanning, tunneling microscopy
- in
- Surface Science
- volume
- 617
- pages
- 211 - 217
- publisher
- Elsevier
- external identifiers
-
- wos:000326141100031
- scopus:84883824904
- ISSN
- 0039-6028
- DOI
- 10.1016/j.susc.2013.07.019
- language
- English
- LU publication?
- yes
- additional info
- The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Chemical Physics (S) (011001060)
- id
- f51708b4-e0b1-48b4-b2b9-5ab5746cb9ae (old id 4212706)
- date added to LUP
- 2016-04-01 14:58:13
- date last changed
- 2022-04-06 13:23:50
@article{f51708b4-e0b1-48b4-b2b9-5ab5746cb9ae, abstract = {{The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high enough (500 degrees C). The ordered structure exhibits a LEED pattern characteristic for a rectangular surface unit cell. By performing the deposition at different temperatures it is possible to tune the balance between the 2D and 3D phases: Growth at 500 degrees C significantly favors the formation of 3D TiO2 islands as compared to growth at 200 degrees C and 300 degrees C. (C) 2013 Elsevier B.V. All rights reserved.}}, author = {{Ragazzon, D. and Schaefer, A. and Farstad, M. H. and Walle, L. E. and Palmgren, P. and Borg, A. and Uvdal, Per and Sandell, A.}}, issn = {{0039-6028}}, keywords = {{Titanium dioxide; Gold; Chemical vapor deposition; Synchrotron radiation; photoelectron spectroscopy; Low-energy electron diffraction; Scanning; tunneling microscopy}}, language = {{eng}}, pages = {{211--217}}, publisher = {{Elsevier}}, series = {{Surface Science}}, title = {{Chemical vapor deposition of ordered TiOx nanostructures on Au(111)}}, url = {{http://dx.doi.org/10.1016/j.susc.2013.07.019}}, doi = {{10.1016/j.susc.2013.07.019}}, volume = {{617}}, year = {{2013}}, }