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Chemical vapor deposition of ordered TiOx nanostructures on Au(111)

Ragazzon, D. ; Schaefer, A. ; Farstad, M. H. ; Walle, L. E. ; Palmgren, P. ; Borg, A. ; Uvdal, Per LU and Sandell, A. (2013) In Surface Science 617. p.211-217
Abstract
The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high... (More)
The deposition of TiOx (x <= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high enough (500 degrees C). The ordered structure exhibits a LEED pattern characteristic for a rectangular surface unit cell. By performing the deposition at different temperatures it is possible to tune the balance between the 2D and 3D phases: Growth at 500 degrees C significantly favors the formation of 3D TiO2 islands as compared to growth at 200 degrees C and 300 degrees C. (C) 2013 Elsevier B.V. All rights reserved. (Less)
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author
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organization
publishing date
type
Contribution to journal
publication status
published
subject
keywords
Titanium dioxide, Gold, Chemical vapor deposition, Synchrotron radiation, photoelectron spectroscopy, Low-energy electron diffraction, Scanning, tunneling microscopy
in
Surface Science
volume
617
pages
211 - 217
publisher
Elsevier
external identifiers
  • wos:000326141100031
  • scopus:84883824904
ISSN
0039-6028
DOI
10.1016/j.susc.2013.07.019
language
English
LU publication?
yes
additional info
The information about affiliations in this record was updated in December 2015. The record was previously connected to the following departments: Chemical Physics (S) (011001060)
id
f51708b4-e0b1-48b4-b2b9-5ab5746cb9ae (old id 4212706)
date added to LUP
2016-04-01 14:58:13
date last changed
2022-04-06 13:23:50
@article{f51708b4-e0b1-48b4-b2b9-5ab5746cb9ae,
  abstract     = {{The deposition of TiOx (x &lt;= 2) structures on Au(111) by chemical vapor deposition (CVD) in ultrahigh vacuum (UHV) has been investigated with high-resolution core level photoelectron spectroscopy (PES), low-energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Using titanium tetra-isopropoxide as single source precursor it is possible to form different TiOx phases on the surface after deposition: at low coverages, we observe large two-dimensional (2D) honeycomb-lattice Ti2O3 islands with a (2 x 2) registry with the substrate. Higher coverages are dominated by the formation of three-dimensional (3D) TiO2 structures. The TiO2 structures are atomically well ordered provided that the deposition temperature is high enough (500 degrees C). The ordered structure exhibits a LEED pattern characteristic for a rectangular surface unit cell. By performing the deposition at different temperatures it is possible to tune the balance between the 2D and 3D phases: Growth at 500 degrees C significantly favors the formation of 3D TiO2 islands as compared to growth at 200 degrees C and 300 degrees C. (C) 2013 Elsevier B.V. All rights reserved.}},
  author       = {{Ragazzon, D. and Schaefer, A. and Farstad, M. H. and Walle, L. E. and Palmgren, P. and Borg, A. and Uvdal, Per and Sandell, A.}},
  issn         = {{0039-6028}},
  keywords     = {{Titanium dioxide; Gold; Chemical vapor deposition; Synchrotron radiation; photoelectron spectroscopy; Low-energy electron diffraction; Scanning; tunneling microscopy}},
  language     = {{eng}},
  pages        = {{211--217}},
  publisher    = {{Elsevier}},
  series       = {{Surface Science}},
  title        = {{Chemical vapor deposition of ordered TiOx nanostructures on Au(111)}},
  url          = {{http://dx.doi.org/10.1016/j.susc.2013.07.019}},
  doi          = {{10.1016/j.susc.2013.07.019}},
  volume       = {{617}},
  year         = {{2013}},
}