Formation of mesophase surfactant-templated silica thin films from acidic solutions
(2004) In Studies in Surface Science and Catalysis 154 A. p.373-379- Abstract
The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is... (More)
The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.
(Less)
- author
- Edler, K. J. LU ; Brennan, T. ; Fernandez-Martin, C. and Roser, S. J.
- publishing date
- 2004
- type
- Contribution to journal
- publication status
- published
- keywords
- Cationic, Formation mechanism, Hierarchical structure, Non-ionic templating, Thin film
- in
- Studies in Surface Science and Catalysis
- volume
- 154 A
- pages
- 7 pages
- publisher
- Elsevier
- external identifiers
-
- scopus:11844304081
- ISSN
- 0167-2991
- DOI
- 10.1016/s0167-2991(04)80825-5
- language
- English
- LU publication?
- no
- id
- fa8a7ea9-91fd-44aa-a0dd-1ac6087a3de9
- date added to LUP
- 2023-05-04 18:41:01
- date last changed
- 2023-06-13 12:16:48
@article{fa8a7ea9-91fd-44aa-a0dd-1ac6087a3de9, abstract = {{<p>The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.</p>}}, author = {{Edler, K. J. and Brennan, T. and Fernandez-Martin, C. and Roser, S. J.}}, issn = {{0167-2991}}, keywords = {{Cationic; Formation mechanism; Hierarchical structure; Non-ionic templating; Thin film}}, language = {{eng}}, pages = {{373--379}}, publisher = {{Elsevier}}, series = {{Studies in Surface Science and Catalysis}}, title = {{Formation of mesophase surfactant-templated silica thin films from acidic solutions}}, url = {{http://dx.doi.org/10.1016/s0167-2991(04)80825-5}}, doi = {{10.1016/s0167-2991(04)80825-5}}, volume = {{154 A}}, year = {{2004}}, }