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Formation of mesophase surfactant-templated silica thin films from acidic solutions

Edler, K. J. LU orcid ; Brennan, T. ; Fernandez-Martin, C. and Roser, S. J. (2004) In Studies in Surface Science and Catalysis 154 A. p.373-379
Abstract

The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is... (More)

The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.

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author
; ; and
publishing date
type
Contribution to journal
publication status
published
keywords
Cationic, Formation mechanism, Hierarchical structure, Non-ionic templating, Thin film
in
Studies in Surface Science and Catalysis
volume
154 A
pages
7 pages
publisher
Elsevier
external identifiers
  • scopus:11844304081
ISSN
0167-2991
DOI
10.1016/s0167-2991(04)80825-5
language
English
LU publication?
no
id
fa8a7ea9-91fd-44aa-a0dd-1ac6087a3de9
date added to LUP
2023-05-04 18:41:01
date last changed
2023-06-13 12:16:48
@article{fa8a7ea9-91fd-44aa-a0dd-1ac6087a3de9,
  abstract     = {{<p>The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic® P123 triblock copolymer surfactant also show a strong dependence of mesostructure development on silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.</p>}},
  author       = {{Edler, K. J. and Brennan, T. and Fernandez-Martin, C. and Roser, S. J.}},
  issn         = {{0167-2991}},
  keywords     = {{Cationic; Formation mechanism; Hierarchical structure; Non-ionic templating; Thin film}},
  language     = {{eng}},
  pages        = {{373--379}},
  publisher    = {{Elsevier}},
  series       = {{Studies in Surface Science and Catalysis}},
  title        = {{Formation of mesophase surfactant-templated silica thin films from acidic solutions}},
  url          = {{http://dx.doi.org/10.1016/s0167-2991(04)80825-5}},
  doi          = {{10.1016/s0167-2991(04)80825-5}},
  volume       = {{154 A}},
  year         = {{2004}},
}