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- 2016
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Mark
Investigation of microstructure evolution during self-annealing in thin Cu films by combining mesoscale level set and ab initio modeling
(
- Contribution to journal › Article
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Mark
Microstructure evolution in Cu thin films, investigated by ab-initio and level set modeling
2016) The 24th International Congress on Theoretical and Applied Mechanics(
- Contribution to conference › Paper, not in proceeding
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Mark
Combined level set and ab-initio modeling of grain structure and texture evolution during self-annealing in thin Cu films
2016) 12th World Congress on Computational Mechanics(
- Contribution to conference › Paper, not in proceeding