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2002
Mark New high resolution negative resist mr-L 6000.1 XP for electron beam and nanoimprint lithography
Maximov, Ivan ^LU ; Beck, Marc ^LU ; Carlberg, Patrick ^LU ; Montelius, Lars ^LU ; Pfeiffer, K. ; Reuther, F. ; Gruetzer, G. ; Schulz, H. ; Wissen, M. and Scheer, H.-C. (2002) Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Improving stamps for 10 nm level wafer scale nanoimprint lithography
Beck, Marc ^LU ; Graczyk, Mariusz ^LU ; Maximov, Ivan ^LU ; Sarwe, Eva-Lena ^LU ; Ling, TGI ; Keil, M and Montelius, Lars ^LU (2002) In Microelectronic Engineering 61-2. p.441-448
- Contribution to journal › Article
Mark Polymer stamps for nanoimprinting
Pfeiffer, K ; Fink, M ; Ahrens, G ; Gruetzner, G ; Reuther, F ; Seekamp, J ; Zankovych, S ; Torres, CMS ; Maximov, Ivan ^LU and Beck, Marc ^LU , et al. (2002) In Microelectronic Engineering 61-2. p.393-398
- Contribution to journal › Article

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