Dissociative NH3 adsorption on the Si(100)2 × 1 surface at 300 K
(1991) In Surface Science 241(3). p.353-356- Abstract
- High resolution electron energy loss spectroscopy has been used to determine how NH3 adsorbs on the Si(100)2 × 1 surface at 300 K. We find that the NH3 molecules dissociate into NH2 and H on adsorption. Combination bands, overtones and double losses for the Si---NH2 group are observed. An anneal to 800 K is sufficient to dissociate the adsorbed NH2 groups while the majority of the Si---H bonds remain intact. An anneal to 1100 K is enough to break the Si-H bonds and start the formation of silicon nitride.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/1056617
- author
- Larsson, Christer LU and Flodström, Anders
- organization
- publishing date
- 1991
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Surface Science
- volume
- 241
- issue
- 3
- pages
- 353 - 356
- publisher
- Elsevier
- external identifiers
-
- scopus:0026412504
- ISSN
- 0039-6028
- DOI
- 10.1016/0039-6028(91)90095-A
- language
- English
- LU publication?
- no
- id
- 9551e52c-dbb1-492a-b20a-b04e8c3f94c3 (old id 1056617)
- date added to LUP
- 2016-04-01 15:34:58
- date last changed
- 2021-01-03 10:51:19
@article{9551e52c-dbb1-492a-b20a-b04e8c3f94c3, abstract = {{High resolution electron energy loss spectroscopy has been used to determine how NH3 adsorbs on the Si(100)2 × 1 surface at 300 K. We find that the NH3 molecules dissociate into NH2 and H on adsorption. Combination bands, overtones and double losses for the Si---NH2 group are observed. An anneal to 800 K is sufficient to dissociate the adsorbed NH2 groups while the majority of the Si---H bonds remain intact. An anneal to 1100 K is enough to break the Si-H bonds and start the formation of silicon nitride.}}, author = {{Larsson, Christer and Flodström, Anders}}, issn = {{0039-6028}}, language = {{eng}}, number = {{3}}, pages = {{353--356}}, publisher = {{Elsevier}}, series = {{Surface Science}}, title = {{Dissociative NH3 adsorption on the Si(100)2 × 1 surface at 300 K}}, url = {{http://dx.doi.org/10.1016/0039-6028(91)90095-A}}, doi = {{10.1016/0039-6028(91)90095-A}}, volume = {{241}}, year = {{1991}}, }