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Droplet-target laser-plasma source for proximity x-ray lithography

Malmqvist, Lennart LU ; Rymell, L and Hertz, H. M (1996) In Applied Physics Letters 68(19). p.2627-2629
Abstract
A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.
Please use this url to cite or link to this publication:
author
; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Applied Physics Letters
volume
68
issue
19
pages
2627 - 2629
publisher
American Institute of Physics (AIP)
external identifiers
  • scopus:0030572086
ISSN
0003-6951
DOI
10.1063/1.116203
language
English
LU publication?
yes
id
7f7d7ef3-ed81-40b7-ad9d-ee45d1904376 (old id 2258973)
date added to LUP
2016-04-04 08:18:41
date last changed
2025-10-14 12:11:21
@article{7f7d7ef3-ed81-40b7-ad9d-ee45d1904376,
  abstract     = {{A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.}},
  author       = {{Malmqvist, Lennart and Rymell, L and Hertz, H. M}},
  issn         = {{0003-6951}},
  language     = {{eng}},
  number       = {{19}},
  pages        = {{2627--2629}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{Applied Physics Letters}},
  title        = {{Droplet-target laser-plasma source for proximity x-ray lithography}},
  url          = {{https://lup.lub.lu.se/search/files/5175667/2297445.pdf}},
  doi          = {{10.1063/1.116203}},
  volume       = {{68}},
  year         = {{1996}},
}