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A new laser-plasma X-ray source for microscopy and lithography

Rymell, Lars LU (1997)
Abstract (Swedish)
Popular Abstract in Swedish

Avhandlingen beskriver en ny typ av kompakt röntgenkälla baserad på ett laser-producerat plasma (LPP). I motsats till konventionella LPP används inte fasta material som strålmål för den fokuserade laserstrålen. I stället används mikroskopiska vätskedroppar eller vätskestrålar. Detta medför en mycket väsentlig minskning av det skräp (debris) som skickas ut från plasmat. Vissa vätskor resulterar i en fullkomligt "ren" källa.



Den nya källan har flera olika tillämpningsområden. Den kan t.ex. användas för röntgenmikroskopi som tillåter högupplösande studier på biologiska preparat i en naturlig våt miljö. En annan tillämpning är röntgenlitografi. Denna teknik gör det möjligt att... (More)
Popular Abstract in Swedish

Avhandlingen beskriver en ny typ av kompakt röntgenkälla baserad på ett laser-producerat plasma (LPP). I motsats till konventionella LPP används inte fasta material som strålmål för den fokuserade laserstrålen. I stället används mikroskopiska vätskedroppar eller vätskestrålar. Detta medför en mycket väsentlig minskning av det skräp (debris) som skickas ut från plasmat. Vissa vätskor resulterar i en fullkomligt "ren" källa.



Den nya källan har flera olika tillämpningsområden. Den kan t.ex. användas för röntgenmikroskopi som tillåter högupplösande studier på biologiska preparat i en naturlig våt miljö. En annan tillämpning är röntgenlitografi. Denna teknik gör det möjligt att tillverka integrerade kretsar som är mindre än de som görs idag. (Less)
Abstract
A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.



The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers,... (More)
A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.



The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers, makes this source suitable for table-top X-ray microscopy and lithography. The initial development of the condenser arrangement for a table-top water-window X-ray microscope is described. (Less)
Please use this url to cite or link to this publication:
author
opponent
  • Dr Lebert, R.
organization
publishing date
type
Thesis
publication status
published
subject
keywords
X-ray microscopy, X-ray lithography, Atomic and molecular physics, multilayer mirror, Fysicumarkivet A:1997:Rymell, Atom- och molekylärfysik, X-ray source, Laser-produced plasma, liquid droplet, debris-free, water window
pages
120 pages
defense location
Lecture hall B, Sölvegatan 14, Lund
defense date
1997-05-23 13:15
external identifiers
  • Other:ISRN: LUTFD2/(TFAF-1033)/1-55(1997)
ISBN
91-628-2497-X
language
English
LU publication?
yes
id
6f0e71a7-e369-41d5-8898-a35506dca891 (old id 29258)
date added to LUP
2007-06-14 15:48:26
date last changed
2016-09-19 08:45:18
@misc{6f0e71a7-e369-41d5-8898-a35506dca891,
  abstract     = {A new high-brightness source for soft X-rays and EUV-radiation has been developed. This laser-plasma source utilizes a microscopic liquid droplet or jet as target. The result is a reduction of debris emission by several orders of magnitude compared to conventional laser plasmas. The minute amounts of residual ionic/atomic debris can be obstructed by filters or a localized gas shield. Target liquids which only form gaseous compounds after evaporation yield debris-free operation.<br/><br>
<br/><br>
The negligible debris emission in combination with narrow-bandwidth line radiation, high-brightness, high spatial stability, excellent geometric access and the possibility to perform uninterrupted target generation for high repetition-rate lasers, makes this source suitable for table-top X-ray microscopy and lithography. The initial development of the condenser arrangement for a table-top water-window X-ray microscope is described.},
  author       = {Rymell, Lars},
  isbn         = {91-628-2497-X},
  keyword      = {X-ray microscopy,X-ray lithography,Atomic and molecular physics,multilayer mirror,Fysicumarkivet A:1997:Rymell,Atom- och molekylärfysik,X-ray source,Laser-produced plasma,liquid droplet,debris-free,water window},
  language     = {eng},
  pages        = {120},
  title        = {A new laser-plasma X-ray source for microscopy and lithography},
  year         = {1997},
}