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An alignment procedure for nanoimprint lithography at the sub-20 nm level

Adolph, David LU ; Bolmsjö, E; Theander, Elke LU ; Saers, R; Graczyk, Mariusz LU ; Hessman, Dan LU ; Maximov, Ivan LU ; Andersson-Engels, Stefan LU ; Persson, Anders LU and Wahlström, Claes-Göran LU , et al. (2005) 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005) In Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
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Chapter in Book/Report/Conference proceeding
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Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
conference name
49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)
language
English
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yes
id
b410b525-f2cd-494d-a3f3-8bfcaeba98b1 (old id 962753)
date added to LUP
2008-01-28 13:08:18
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2016-04-16 12:18:08
@misc{b410b525-f2cd-494d-a3f3-8bfcaeba98b1,
  author       = {Adolph, David and Bolmsjö, E and Theander, Elke and Saers, R and Graczyk, Mariusz and Hessman, Dan and Maximov, Ivan and Andersson-Engels, Stefan and Persson, Anders and Wahlström, Claes-Göran and Beck, Marc and Carlberg, Patrick and Heidari, B and Montelius, Lars},
  language     = {eng},
  series       = {Book of extended abstracts: 49th Intl Conf on Electron, Ion, and Photon Beam Technol and Nanofabr, Orlando, Fl, USA (2005)},
  title        = {An alignment procedure for nanoimprint lithography at the sub-20 nm level},
  year         = {2005},
}