Ivan Maximov

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2022
Mark Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer
Löfstrand, Anette ^LU ; Vorobiev, Alexei ; Mumtaz, Muhammad ; Borsali, Redouane and Maximov, Ivan ^LU (2022) In Polymers 14(4). p.1-12
- Contribution to journal › Article
Mark Directed Self‐Assembly for Dense Vertical III–V Nanowires on Si and Implications for Gate All‐Around Deposition
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Svensson, Johannes ^LU ; Jönsson, Adam ^LU ; Menon, Heera ^LU ; Jacobsson, Daniel ; Wernersson, Lars-Erik ^LU and Maximov, Ivan ^LU (2022) In Advanced Electronic Materials 8(9).
- Contribution to journal › Article
Mark Comparison of UV-curable materials for high-resolution polymer nanoimprint stamps
Asif, Muhammad ^LU ; Graczyk, Mariusz ^LU ; Heidari, Babak and Maximov, Ivan ^LU (2022) In Micro and Nano Engineering 14.
- Contribution to journal › Article
Mark Investigating the Secondary Electron Emission of Nanomaterials Induced by a High-Resolution Proton Beam
Cholewa, Marian ; Gredysa, Anna ; Pozaruk, Andrii ; Osipowicz, Thomas ; van Kan, Jeroen A. ; Dou, Yan X. ; Yan, Peiyan ; Bettiol, Andrew A. ; Maximov, Ivan ^LU and Sobanska, Maria , et al. (2022) In Physica Status Solidi (B)
- Contribution to journal › Article
Mark Tolerance of metal halide perovskites to mechanical treatment enables the fabrication of patterned luminescence nano- and microstructures
Li, Jun ^LU ; Yangui, Aymen ^LU ; Jafari Jam, Reza ^LU ; An, Qingzhi ; Vaynzof, Yana ; Unger, Eva ^LU ; Maximov, Ivan ^LU and Scheblykin, Ivan G. ^LU (2022) In Materials Advances 27(35).
- Contribution to journal › Article
2021
Mark Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Mumtaz, Muhammad ; Mothander, Karolina ^LU ; Nylander, Tommy ^LU ; Vorobiev, Alexei ; Rahaman, Ahibur ^LU ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan ^LU (2021) Advances in Patterning Materials and Processes XXXVIII 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11612.
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer : Implications for Transistor Fabrication
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Mothander, Karolina ^LU ; Nylander, Tommy ^LU ; Mumtaz, Muhammad ; Vorobiev, Alexei ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan ^LU (2021) In ACS Applied Nano Materials 4(5). p.5141-5151
- Contribution to journal › Article
2020
Mark Wafer-scale nanofabrication of sub-100 nm arrays by deep-UV displacement Talbot lithography
Gómez, Víctor J. ^LU ; Graczyk, Mariusz ^LU ; Jam, Reza Jafari ^LU ; Lehmann, Sebastian ^LU and Maximov, Ivan ^LU (2020) In Nanotechnology 31(29).
- Contribution to journal › Article
Mark Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
Löfstrand, Anette ^LU ; Svensson, Johannes ^LU ; Wernersson, Lars Erik ^LU and Maximov, Ivan ^LU (2020) In Nanotechnology 31(32).
- Contribution to journal › Article
2019
Mark Design and development of nanoimprint-enabled structures for molecular motor devices
Lindberg, Frida W. ^LU ; Korten, Till ; Löfstrand, Anette ^LU ; Rahman, Mohammad A. ; Graczyk, Mariusz ^LU ; Månsson, Alf ; Linke, Heiner ^LU and Maximov, Ivan ^LU (2019) In Materials Research Express 6(2).
- Contribution to journal › Article

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