New high-resolution SiO2-based positive-tone resist for electron beam lithography
(2023) 49-th International Conference on Micro- and Nano-Engineering
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/895be2d1-b5f1-4545-9e41-fc968a322571
- author
- Cattoni, Andrea ; Mailly, Dominique and Maximov, Ivan LU
- organization
- publishing date
- 2023-09-27
- type
- Contribution to conference
- publication status
- published
- subject
- conference name
- 49-th International Conference on Micro- and Nano-Engineering
- conference location
- Berlin, Germany
- conference dates
- 2023-09-25 - 2023-09-27
- language
- English
- LU publication?
- yes
- id
- 895be2d1-b5f1-4545-9e41-fc968a322571
- date added to LUP
- 2024-02-06 11:32:32
- date last changed
- 2024-09-10 08:42:36
@misc{895be2d1-b5f1-4545-9e41-fc968a322571,
author = {{Cattoni, Andrea and Mailly, Dominique and Maximov, Ivan}},
language = {{eng}},
month = {{09}},
title = {{New high-resolution SiO2-based positive-tone resist for electron beam lithography}},
year = {{2023}},
}