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- 2022
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Mark
Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer
(
- Contribution to journal › Article
- 2021
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Mark
Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer : Implications for Transistor Fabrication
(
- Contribution to journal › Article
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Mark
Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
2021) Advances in Patterning Materials and Processes XXXVIII 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11612.(
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
- 2019
-
Mark
Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
2019) 5-th DSA Symposium(
- Contribution to conference › Poster