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Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose

Löfstrand, Anette LU ; Suyatin, Dmitry LU orcid ; Nilsson, Nicklas ; Otsuka, Issei ; Kvennefors, Anders LU ; Ring, Johan ; Borsali, Redouane and Maximov, Ivan LU (2019) 5-th DSA Symposium
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author
; ; ; ; ; ; and
organization
publishing date
type
Contribution to conference
publication status
unpublished
subject
conference name
5-th DSA Symposium
conference location
Milan, Italy
conference dates
2019-10-16 - 2019-10-18
language
English
LU publication?
yes
id
6b2eae02-633d-46d8-9c2a-45874c66e6a9
date added to LUP
2020-01-21 14:29:59
date last changed
2022-04-06 12:36:15
@misc{6b2eae02-633d-46d8-9c2a-45874c66e6a9,
  author       = {{Löfstrand, Anette and Suyatin, Dmitry and Nilsson, Nicklas and Otsuka, Issei and Kvennefors, Anders and Ring, Johan and Borsali, Redouane and Maximov, Ivan}},
  language     = {{eng}},
  month        = {{10}},
  title        = {{Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose}},
  year         = {{2019}},
}