Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
(2019) 5-th DSA Symposium
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/6b2eae02-633d-46d8-9c2a-45874c66e6a9
- author
- Löfstrand, Anette LU ; Suyatin, Dmitry LU ; Nilsson, Nicklas ; Otsuka, Issei ; Kvennefors, Anders LU ; Ring, Johan ; Borsali, Redouane and Maximov, Ivan LU
- organization
- publishing date
- 2019-10-16
- type
- Contribution to conference
- publication status
- unpublished
- subject
- conference name
- 5-th DSA Symposium
- conference location
- Milan, Italy
- conference dates
- 2019-10-16 - 2019-10-18
- language
- English
- LU publication?
- yes
- id
- 6b2eae02-633d-46d8-9c2a-45874c66e6a9
- date added to LUP
- 2020-01-21 14:29:59
- date last changed
- 2022-04-06 12:36:15
@misc{6b2eae02-633d-46d8-9c2a-45874c66e6a9, author = {{Löfstrand, Anette and Suyatin, Dmitry and Nilsson, Nicklas and Otsuka, Issei and Kvennefors, Anders and Ring, Johan and Borsali, Redouane and Maximov, Ivan}}, language = {{eng}}, month = {{10}}, title = {{Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose}}, year = {{2019}}, }