Anette Löfstrand

1 – 10 of 11

show: 10
|
sort: year (new to old)

News feed Embed this list Save this search Mark all Export

Cancel

Embed this list

copy and paste the html snippet below into your own page:

<iframe src="https://lup.lub.lu.se/search/person/an1437lo?embed=1&amp;hide_pagination=1&amp;hide_info=1&amp;hide_options=1"
  width="100%"
  height="400"
  allowtransparency="true"
  frameborder="0">
</iframe>

« previous
1
2
next »

2022
Mark Directed Self‐Assembly for Dense Vertical III–V Nanowires on Si and Implications for Gate All‐Around Deposition
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Svensson, Johannes ^LU ; Jönsson, Adam ^LU ; Menon, Heera ^LU ; Jacobsson, Daniel ; Wernersson, Lars-Erik ^LU and Maximov, Ivan ^LU (2022) In Advanced Electronic Materials
- Contribution to journal › Article
Mark Sequential Infiltration Synthesis into Maltoheptaose and Poly(styrene): Implications for Sub-10 nm Pattern Transfer
Löfstrand, Anette ^LU ; Vorobiev, Alexei ; Mumtaz, Muhammad ; Borsali, Redouane and Maximov, Ivan ^LU (2022) In Polymers 14(4). p.1-12
- Contribution to journal › Article
2021
Mark Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Mumtaz, Muhammad ; Mothander, Karolina ^LU ; Nylander, Tommy ^LU ; Vorobiev, Alexei ; Rahaman, Ahibur ^LU ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan ^LU (2021) Advances in Patterning Materials and Processes XXXVIII 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11612.
- Chapter in Book/Report/Conference proceeding › Paper in conference proceeding
Mark Poly(styrene)- block-Maltoheptaose Films for Sub-10 nm Pattern Transfer : Implications for Transistor Fabrication
Löfstrand, Anette ^LU ; Jafari Jam, Reza ^LU ; Mothander, Karolina ^LU ; Nylander, Tommy ^LU ; Mumtaz, Muhammad ; Vorobiev, Alexei ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan ^LU (2021) In ACS Applied Nano Materials 4(5). p.5141-5151
- Contribution to journal › Article
Mark Block Copolymer Nanolithography for Sub-50 nm Structure Applications
Löfstrand, Anette ^LU (2021)
- Thesis › Doctoral thesis (compilation)
2020
Mark Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
Löfstrand, Anette ^LU ; Svensson, Johannes ^LU ; Wernersson, Lars Erik ^LU and Maximov, Ivan ^LU (2020) In Nanotechnology 31(32).
- Contribution to journal › Article
2019
Mark Design and development of nanoimprint-enabled structures for molecular motor devices
Lindberg, Frida W. ^LU ; Korten, Till ; Löfstrand, Anette ^LU ; Rahman, Mohammad A. ; Graczyk, Mariusz ^LU ; Månsson, Alf ; Linke, Heiner ^LU and Maximov, Ivan ^LU (2019) In Materials Research Express 6(2).
- Contribution to journal › Article
Mark Block Copolymer Lithography. Applications for Sub-50 nm High-Density Nanostructures
Löfstrand, Anette ^LU (2019)
- Thesis › Licentiate thesis
Mark Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
Löfstrand, Anette ^LU ; Suyatin, Dmitry ^LU ; Nilsson, Nicklas ; Otsuka, Issei ; Kvennefors, Anders ^LU ; Ring, Johan ; Borsali, Redouane and Maximov, Ivan ^LU (2019) 5-th DSA Symposium
- Contribution to conference › Poster
2018
Mark Block Copolymer Nanopatterning of Dielectric Mask for Selective Area InAs Vertical Nanowire Growth
Löfstrand, Anette ^LU ; Graczyk, Mariusz ^LU ; Suyatin, Dmitry ^LU ; Kvennefors, Anders ^LU ; Maximov, Ivan ^LU ; Svensson, Johannes ^LU and Wernersson, Lars-Erik ^LU (2018) 4-th International Symposium on DSA, November 11-13, 2018, Sapporo, Japan
- Contribution to conference › Abstract

« previous
1
2
next »