Anette Löfstrand
1 – 6 of 6
- show: 10
- |
- sort: year (new to old)
Close
Embed this list
<iframe src=""
width=""
height=""
allowtransparency="true"
frameborder="0">
</iframe>
- 2020
- Feature size control using surface reconstruction temperature in block copolymer lithography for InAs nanowire growth
- 2019
-
Design and development of nanoimprint-enabled structures for molecular motor devices
Lindberg, Frida W. LU ; Korten, Till ; Löfstrand, Anette LU ; Rahman, Mohammad A. ; Graczyk, Mariusz LU ; Månsson, Alf ; Linke, Heiner LU
and Maximov, Ivan
LU
(2019)
In Materials Research Express
6(2).
Mark
- Block Copolymer Lithography. Applications for Sub-50 nm High-Density Nanostructures
-
Sub-10 nm Block Copolymer Lithography: Sequential Infiltration Synthesis into Poly(Styrene)-block-Maltoheptaose
Löfstrand, Anette LU ; Suyatin, Dmitry LU
; Nilsson, Nicklas
; Otsuka, Issei
; Kvennefors, Anders
LU
; Ring, Johan
; Borsali, Redouane
and Maximov, Ivan
LU
(2019)
5-th DSA Symposium
Mark
- 2018
- Nanoimprint stamps with ultra-high resolution : Optimal fabrication techniques
-
Block Copolymer Nanopatterning of Dielectric Mask for Selective Area InAs Vertical Nanowire Growth
Löfstrand, Anette LU ; Graczyk, Mariusz LU ; Suyatin, Dmitry LU
; Kvennefors, Anders
LU
; Maximov, Ivan
LU
; Svensson, Johannes
LU
and Wernersson, Lars-Erik
LU
(2018)
4-th International Symposium on DSA, November 11-13, 2018, Sapporo, Japan
Mark