Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer
(2021) Advances in Patterning Materials and Processes XXXVIII 2020 In Proceedings of SPIE - The International Society for Optical Engineering 11612.- Abstract
This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a... (More)
This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.
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- author
- Löfstrand, Anette LU ; Jafari Jam, Reza LU ; Mumtaz, Muhammad ; Mothander, Karolina LU ; Nylander, Tommy LU ; Vorobiev, Alexei ; Rahaman, Ahibur LU ; Chen, Wen Chang ; Borsali, Redouane and Maximov, Ivan LU
- organization
- publishing date
- 2021
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- keywords
- Block copolymer, Carbohydrate, Pattern transfer, Sequential infiltration synthesis, Specular neutron reflectometry
- host publication
- Advances in Patterning Materials and Processes XXXVIII
- series title
- Proceedings of SPIE - The International Society for Optical Engineering
- editor
- Sanders, Daniel P. and Guerrero, Douglas
- volume
- 11612
- article number
- 116120W
- publisher
- SPIE
- conference name
- Advances in Patterning Materials and Processes XXXVIII 2020
- conference location
- Virtual, Online, United States
- conference dates
- 2021-02-22 - 2021-02-26
- external identifiers
-
- scopus:85103335676
- ISSN
- 1996-756X
- 0277-786X
- ISBN
- 9781510640573
- DOI
- 10.1117/12.2583803
- language
- English
- LU publication?
- yes
- id
- 7d04fcd1-ddcd-4f60-8bdc-09518744e2c6
- date added to LUP
- 2021-04-08 12:47:47
- date last changed
- 2024-04-20 04:26:18
@inproceedings{7d04fcd1-ddcd-4f60-8bdc-09518744e2c6,
abstract = {{<p>This study presents how sequential infiltration synthesis of trimethyl aluminium and water into a carbohydrate-based block copolymer was used to enable pattern transfer of 6 nm half-pitch horizontal cylinders into silicon. Specular neutron reflectometry measurements of poly(styrene)-block-maltoheptaose self-assembled into horizontal cylinders indicate an increasing content of alumina after each sequential infiltration cycle, comparing 0, 1, 2, and 4 cycles, with alumina content reaching 2.4 vol% after four infiltrations cycles. Dry etching processes in inductively coupled plasma reactive ion etching for sub-10 nm patterns were developed, using a two-step technique: O2-plasma for polymer removal and a reactive ion etching of Si using a mixture of SF6 and C4F8 gases. Etch selectivity of more than 2:1 of silicon over alumina-like etch mask material was achieved. To evaluate the etching process, the etched Si structures were measured and characterized by scanning electron microscopy. These results are expected to be of use for nanofabrication and applications in the sub-10 nm regime.</p>}},
author = {{Löfstrand, Anette and Jafari Jam, Reza and Mumtaz, Muhammad and Mothander, Karolina and Nylander, Tommy and Vorobiev, Alexei and Rahaman, Ahibur and Chen, Wen Chang and Borsali, Redouane and Maximov, Ivan}},
booktitle = {{Advances in Patterning Materials and Processes XXXVIII}},
editor = {{Sanders, Daniel P. and Guerrero, Douglas}},
isbn = {{9781510640573}},
issn = {{1996-756X}},
keywords = {{Block copolymer; Carbohydrate; Pattern transfer; Sequential infiltration synthesis; Specular neutron reflectometry}},
language = {{eng}},
publisher = {{SPIE}},
series = {{Proceedings of SPIE - The International Society for Optical Engineering}},
title = {{Sequential infiltration synthesis and pattern transfer using 6 nm half-pitch carbohydrate-based fingerprint block copolymer}},
url = {{http://dx.doi.org/10.1117/12.2583803}},
doi = {{10.1117/12.2583803}},
volume = {{11612}},
year = {{2021}},
}