Core-level shifts on the H2O exposed Ge(100)2×1 surface
(1989) In Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films 7(3). p.2044-2048- Abstract
- Core-level spectroscopy and valence-band photoelectron spectroscopy were used to study the Ge(100)2×1 surface dosed with 0.5–100 L H2O at 160 K. It is determined that H2O adsorbs molecularly at 160 K and forms ice. The H2O molecules dissociate into H and OH radicals on the Ge(100)2×1 surface when the sample is heated to 300 K. A simple adsorption model that accounts for the calculated H and OH coverages is proposed.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/1056630
- author
- Larsson, Christer LU ; Flodström, Anders ; Karlsson, Ulf and Yang, Yi-xin
- organization
- publishing date
- 1989
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- MEDIUM TEMPERATURE, LOW TEMPERATURE, PHOTOELECTRON SPECTROSCOPY, CHEMISORPTION, ICE, WATER, SURFACE STRUCTURE, GERMANIUM, SURFACE REACTIONS, ELECTRON DIFFRACTION
- in
- Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
- volume
- 7
- issue
- 3
- pages
- 2044 - 2048
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- scopus:84957285694
- ISSN
- 1520-8559
- DOI
- 10.1116/1.575967
- language
- English
- LU publication?
- no
- id
- b1e486bb-6511-449a-9a8a-16690c31d8fb (old id 1056630)
- date added to LUP
- 2016-04-01 12:10:51
- date last changed
- 2021-01-03 10:09:17
@article{b1e486bb-6511-449a-9a8a-16690c31d8fb, abstract = {{Core-level spectroscopy and valence-band photoelectron spectroscopy were used to study the Ge(100)2×1 surface dosed with 0.5–100 L H2O at 160 K. It is determined that H2O adsorbs molecularly at 160 K and forms ice. The H2O molecules dissociate into H and OH radicals on the Ge(100)2×1 surface when the sample is heated to 300 K. A simple adsorption model that accounts for the calculated H and OH coverages is proposed.}}, author = {{Larsson, Christer and Flodström, Anders and Karlsson, Ulf and Yang, Yi-xin}}, issn = {{1520-8559}}, keywords = {{MEDIUM TEMPERATURE; LOW TEMPERATURE; PHOTOELECTRON SPECTROSCOPY; CHEMISORPTION; ICE; WATER; SURFACE STRUCTURE; GERMANIUM; SURFACE REACTIONS; ELECTRON DIFFRACTION}}, language = {{eng}}, number = {{3}}, pages = {{2044--2048}}, publisher = {{American Institute of Physics (AIP)}}, series = {{Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films}}, title = {{Core-level shifts on the H2O exposed Ge(100)2×1 surface}}, url = {{http://dx.doi.org/10.1116/1.575967}}, doi = {{10.1116/1.575967}}, volume = {{7}}, year = {{1989}}, }