Spatial Structures Formed during High-Temperature Vacuum Annealing of Diamond-Like Film Deposited on a Silicon Substrate
(2009) In Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques 3(5). p.752-755- Abstract
- The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the... (More)
- The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the adjacent region at the following stage. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/1507332
- author
- Tsetlin, M. B. ; Zakharov, Alexei LU ; Maslakov, K. I. ; Mikheeva, M. N. and Lindau, I.
- organization
- publishing date
- 2009
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques
- volume
- 3
- issue
- 5
- pages
- 752 - 755
- publisher
- MAIK Nauka/Interperiodica
- external identifiers
-
- wos:000270744900015
- scopus:76349121029
- ISSN
- 1027-4510
- DOI
- 10.1134/S1027451009050152
- language
- English
- LU publication?
- yes
- id
- c41f4f68-4a36-4636-9768-993ec64c4075 (old id 1507332)
- date added to LUP
- 2016-04-01 14:58:10
- date last changed
- 2022-01-28 03:21:11
@article{c41f4f68-4a36-4636-9768-993ec64c4075,
abstract = {{The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the adjacent region at the following stage.}},
author = {{Tsetlin, M. B. and Zakharov, Alexei and Maslakov, K. I. and Mikheeva, M. N. and Lindau, I.}},
issn = {{1027-4510}},
language = {{eng}},
number = {{5}},
pages = {{752--755}},
publisher = {{MAIK Nauka/Interperiodica}},
series = {{Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques}},
title = {{Spatial Structures Formed during High-Temperature Vacuum Annealing of Diamond-Like Film Deposited on a Silicon Substrate}},
url = {{http://dx.doi.org/10.1134/S1027451009050152}},
doi = {{10.1134/S1027451009050152}},
volume = {{3}},
year = {{2009}},
}