Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers
(2004) In Journal of Polymer Science, Part A: Polymer Chemistry 42(6). p.1415-1420- Abstract
The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration.
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https://lup.lub.lu.se/record/231a9c7a-5460-4832-abd0-a4ac90880a2f
- author
- Sangermano, M. ; Bongiovanni, R. ; Malucelli, G. ; Priola, A. ; Olbrych, J. ; Harden, A. and Rehnberg, N. LU
- publishing date
- 2004-03-15
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Cationic photopolymerization, Coatings, Differential scanning calorimetry (DSC), Oxetane monomers, Silicon monomers, Surface tension, Wettability
- in
- Journal of Polymer Science, Part A: Polymer Chemistry
- volume
- 42
- issue
- 6
- pages
- 6 pages
- publisher
- John Wiley & Sons Inc.
- external identifiers
-
- scopus:1542335769
- ISSN
- 0887-624X
- DOI
- 10.1002/pola.20005
- language
- English
- LU publication?
- no
- id
- 231a9c7a-5460-4832-abd0-a4ac90880a2f
- date added to LUP
- 2021-11-25 11:39:04
- date last changed
- 2022-04-03 22:07:52
@article{231a9c7a-5460-4832-abd0-a4ac90880a2f, abstract = {{<p>The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration.</p>}}, author = {{Sangermano, M. and Bongiovanni, R. and Malucelli, G. and Priola, A. and Olbrych, J. and Harden, A. and Rehnberg, N.}}, issn = {{0887-624X}}, keywords = {{Cationic photopolymerization; Coatings; Differential scanning calorimetry (DSC); Oxetane monomers; Silicon monomers; Surface tension; Wettability}}, language = {{eng}}, month = {{03}}, number = {{6}}, pages = {{1415--1420}}, publisher = {{John Wiley & Sons Inc.}}, series = {{Journal of Polymer Science, Part A: Polymer Chemistry}}, title = {{Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers}}, url = {{http://dx.doi.org/10.1002/pola.20005}}, doi = {{10.1002/pola.20005}}, volume = {{42}}, year = {{2004}}, }