Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis
(2012) In Surface & Coatings Technology 206(10). p.2629-2637- Abstract
- Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and... (More)
- Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved. (Less)
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/2416388
- author
- Wang, Tiegang LU ; Jeong, Dawoon ; Kim, Soo-Hyun ; Wang, Qimin ; Shin, Dong-Woo ; Melin, Solveig LU ; Iyengar, Srinivasan LU and Kim, Kwang Ho
- organization
- publishing date
- 2012
- type
- Contribution to journal
- publication status
- published
- subject
- keywords
- Cr2O3 film, Arc ion plating, Bias voltage, Grain size, Surface, morphology, HRTEM
- in
- Surface & Coatings Technology
- volume
- 206
- issue
- 10
- pages
- 2629 - 2637
- publisher
- Elsevier
- external identifiers
-
- wos:000299713600001
- scopus:84855258565
- ISSN
- 0257-8972
- DOI
- 10.1016/j.surfcoat.2011.10.058
- language
- English
- LU publication?
- yes
- id
- 266c0db9-a406-4adc-a507-56b65a5678b1 (old id 2416388)
- date added to LUP
- 2016-04-01 13:08:30
- date last changed
- 2022-03-29 05:50:49
@article{266c0db9-a406-4adc-a507-56b65a5678b1, abstract = {{Nanocrystalline Cr2O3 thin films were deposited on silicon wafers with (100) orientation by arc ion plating (AIP) technique at various negative bias voltages. By virtue of X-ray diffraction analysis, scanning electron microscope, and high-resolution transmission electron microscope, the influence of substrate bias voltage on the film growth process, microstructure, and characteristics was investigated systematically, including the phase constituents, grain size, lattice constant, chemical compositions, as well as surface and cross-section morphologies. With increasing the bias voltage, the grain size and lattice constant of AIP Cr2O3 films first decreased slightly, and then increased gradually again. Both reached the minimum (35 nm and 13.57 angstrom) when the bias voltage was - 100 V. However, the bias voltage had little effect on the phase constituents and chemical compositions of AIP Cr2O3 films. During the film growth process, the surfaces of Cr2O3 films were getting smoother with the negative bias voltage increase, in the meantime, their microstructures evolved from coarse columnar grains to fine columnar grains, short columnar recrystallized grains, and fine columnar grains again. (C) 2011 Elsevier B.V. All rights reserved.}}, author = {{Wang, Tiegang and Jeong, Dawoon and Kim, Soo-Hyun and Wang, Qimin and Shin, Dong-Woo and Melin, Solveig and Iyengar, Srinivasan and Kim, Kwang Ho}}, issn = {{0257-8972}}, keywords = {{Cr2O3 film; Arc ion plating; Bias voltage; Grain size; Surface; morphology; HRTEM}}, language = {{eng}}, number = {{10}}, pages = {{2629--2637}}, publisher = {{Elsevier}}, series = {{Surface & Coatings Technology}}, title = {{Study on nanocrystalline Cr2O3 films deposited by arc ion plating: I. composition, morphology, and microstructure analysis}}, url = {{http://dx.doi.org/10.1016/j.surfcoat.2011.10.058}}, doi = {{10.1016/j.surfcoat.2011.10.058}}, volume = {{206}}, year = {{2012}}, }