High rate direct current reactive sputter deposition of Al2O3 - Required process parameters
(1997) 11th International colloquium on plasma processes p.176-176
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/4645023
- author
- Macak, Karol ; Olsson, Maryam LU and Helmersson, Ulf
- publishing date
- 1997
- type
- Chapter in Book/Report/Conference proceeding
- publication status
- published
- subject
- host publication
- CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997
- pages
- 176 - 176
- publisher
- Société française du vide
- conference name
- 11th International colloquium on plasma processes
- conference location
- Le Mans, France
- conference dates
- 1997-05-25 - 1997-05-29
- external identifiers
-
- scopus:20544474791
- language
- English
- LU publication?
- no
- id
- 12e7d268-680c-4854-a83d-5552874e6428 (old id 4645023)
- date added to LUP
- 2016-04-04 11:41:52
- date last changed
- 2022-01-29 22:20:15
@inproceedings{12e7d268-680c-4854-a83d-5552874e6428, author = {{Macak, Karol and Olsson, Maryam and Helmersson, Ulf}}, booktitle = {{CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997}}, language = {{eng}}, pages = {{176--176}}, publisher = {{Société française du vide}}, title = {{High rate direct current reactive sputter deposition of Al2O3 - Required process parameters}}, year = {{1997}}, }