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Preparation and characterization of Ti-Zr-V non-evaporable getter films to be used in Ultra-high acuum

Ferreira, Marcelo J. LU ; Tallarico, Denise A. and Nascente, Pedro A.P. (2009) 6th International Conference on Synchrotron Radiation in Materials Science In AIP Conference Proceedings 1092(1). p.168-172
Abstract

An appealing procedure to obtain operating pressures in the 10-8 Pa range, which is necessary for the insertion devices elements of synchrotron sources, is to coat the inner ultra-high vacuum chamber walls with a thin film of non-evaporable getter (NEG) metals. Titanium, zirconium, vanadium, and their alloys are used as NEG materials due to their low activation temperature, high chemical activity, large solubility, and high diffusivity for gases. In this work, magnetron sputtering was employed to deposit thin films of Ti-Zr-V on a Si(111) substrate. The morphological, structural, and chemical analyses were carried out by atomic force microscopy (AFM), scanning electron microscopy (SEM) with energy-dispersive spectroscopy... (More)

An appealing procedure to obtain operating pressures in the 10-8 Pa range, which is necessary for the insertion devices elements of synchrotron sources, is to coat the inner ultra-high vacuum chamber walls with a thin film of non-evaporable getter (NEG) metals. Titanium, zirconium, vanadium, and their alloys are used as NEG materials due to their low activation temperature, high chemical activity, large solubility, and high diffusivity for gases. In this work, magnetron sputtering was employed to deposit thin films of Ti-Zr-V on a Si(111) substrate. The morphological, structural, and chemical analyses were carried out by atomic force microscopy (AFM), scanning electron microscopy (SEM) with energy-dispersive spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS).

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Please use this url to cite or link to this publication:
author
; and
publishing date
type
Chapter in Book/Report/Conference proceeding
publication status
published
subject
keywords
Coatings, NEG, Non-evaporable getter, Synchrotron., Thin films, Ultra-high vacuum
host publication
SYNCHROTRON RADIATION IN MATERIALS SCIENCE: : Proceedings of the 6th International Conference on Synchrotron Radiation in Materials Science - Proceedings of the 6th International Conference on Synchrotron Radiation in Materials Science
series title
AIP Conference Proceedings
volume
1092
issue
1
pages
5 pages
publisher
American Institute of Physics (AIP)
conference name
6th International Conference on Synchrotron Radiation in Materials Science
conference location
Campinas, Sao Paulo, Brazil
conference dates
2008-07-20 - 2008-07-23
external identifiers
  • scopus:64849084243
ISSN
0094-243X
DOI
10.1063/1.3086219
language
English
LU publication?
no
id
6219eb7b-071f-42dc-9872-e761b369e7c5
date added to LUP
2025-01-26 11:45:02
date last changed
2025-05-23 10:29:13
@inproceedings{6219eb7b-071f-42dc-9872-e761b369e7c5,
  abstract     = {{<p>An appealing procedure to obtain operating pressures in the 10<sup>-8</sup> Pa range, which is necessary for the insertion devices elements of synchrotron sources, is to coat the inner ultra-high vacuum chamber walls with a thin film of non-evaporable getter (NEG) metals. Titanium, zirconium, vanadium, and their alloys are used as NEG materials due to their low activation temperature, high chemical activity, large solubility, and high diffusivity for gases. In this work, magnetron sputtering was employed to deposit thin films of Ti-Zr-V on a Si(111) substrate. The morphological, structural, and chemical analyses were carried out by atomic force microscopy (AFM), scanning electron microscopy (SEM) with energy-dispersive spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS).</p>}},
  author       = {{Ferreira, Marcelo J. and Tallarico, Denise A. and Nascente, Pedro A.P.}},
  booktitle    = {{SYNCHROTRON RADIATION IN MATERIALS SCIENCE: : Proceedings of the 6th International Conference on Synchrotron Radiation in Materials Science}},
  issn         = {{0094-243X}},
  keywords     = {{Coatings; NEG; Non-evaporable getter; Synchrotron.; Thin films; Ultra-high vacuum}},
  language     = {{eng}},
  number       = {{1}},
  pages        = {{168--172}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{AIP Conference Proceedings}},
  title        = {{Preparation and characterization of Ti-Zr-V non-evaporable getter films to be used in Ultra-high acuum}},
  url          = {{http://dx.doi.org/10.1063/1.3086219}},
  doi          = {{10.1063/1.3086219}},
  volume       = {{1092}},
  year         = {{2009}},
}