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UHV and Ambient Pressure XPS : Potentials for Mg, MgO, and Mg(OH)2 Surface Analysis

Head, Ashley R. LU and Schnadt, Joachim LU (2016) In JOM 68(12). p.3070-3077
Abstract

The surface sensitivity of x-ray photoelectron spectroscopy (XPS) has positioned the technique as a routine analysis tool for chemical and electronic structure information. Samples ranging from ideal model systems to industrial materials can be analyzed. Instrumentational developments in the past two decades have popularized ambient pressure XPS, with pressures in the tens of mbar now commonplace. Here, we briefly review the technique, including a discussion of developments that allow data collection at higher pressures. We illustrate the information XPS can provide by using examples from the literature, including MgO studies. We hope to illustrate the possibilities of ambient pressure XPS to Mg, MgO, and Mg(OH)2 systems,... (More)

The surface sensitivity of x-ray photoelectron spectroscopy (XPS) has positioned the technique as a routine analysis tool for chemical and electronic structure information. Samples ranging from ideal model systems to industrial materials can be analyzed. Instrumentational developments in the past two decades have popularized ambient pressure XPS, with pressures in the tens of mbar now commonplace. Here, we briefly review the technique, including a discussion of developments that allow data collection at higher pressures. We illustrate the information XPS can provide by using examples from the literature, including MgO studies. We hope to illustrate the possibilities of ambient pressure XPS to Mg, MgO, and Mg(OH)2 systems, both in fundamental and applied studies.

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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
JOM
volume
68
issue
12
pages
3070 - 3077
publisher
Springer
external identifiers
  • scopus:84989860281
  • wos:000388818100012
ISSN
1047-4838
DOI
10.1007/s11837-016-2112-x
language
English
LU publication?
yes
id
02605d95-d242-46fb-beb4-4c78828e6e67
date added to LUP
2016-10-21 10:25:10
date last changed
2017-10-22 05:20:50
@article{02605d95-d242-46fb-beb4-4c78828e6e67,
  abstract     = {<p>The surface sensitivity of x-ray photoelectron spectroscopy (XPS) has positioned the technique as a routine analysis tool for chemical and electronic structure information. Samples ranging from ideal model systems to industrial materials can be analyzed. Instrumentational developments in the past two decades have popularized ambient pressure XPS, with pressures in the tens of mbar now commonplace. Here, we briefly review the technique, including a discussion of developments that allow data collection at higher pressures. We illustrate the information XPS can provide by using examples from the literature, including MgO studies. We hope to illustrate the possibilities of ambient pressure XPS to Mg, MgO, and Mg(OH)<sub>2</sub> systems, both in fundamental and applied studies.</p>},
  author       = {Head, Ashley R. and Schnadt, Joachim},
  issn         = {1047-4838},
  language     = {eng},
  number       = {12},
  pages        = {3070--3077},
  publisher    = {Springer},
  series       = {JOM},
  title        = {UHV and Ambient Pressure XPS : Potentials for Mg, MgO, and Mg(OH)<sub>2</sub> Surface Analysis},
  url          = {http://dx.doi.org/10.1007/s11837-016-2112-x},
  volume       = {68},
  year         = {2016},
}