Joachim Schnadt
- Synchrotron Radiation Research
 - Department of Physics
 - NanoLund: Centre for Nanoscience
 - eSSENCE: The e-Science Collaboration
 - LTH Profile Area: Nanoscience and Semiconductor Technology
 - LTH Profile Area: Photon Science and Technology
 - LU Profile Area: Light and Materials
 - MAX IV, APXPS
 - MAX IV Laboratory
 - MAX IV, Science division
 - Lund Laser Centre, LLC
 
1 – 10 of 123
      - show: 10
 - |
 - sort: year (new to old)
 
        Close
        
            
    
    Embed this list
<iframe src=""
              width=""
              height=""
              allowtransparency="true"
              frameborder="0">
            </iframe>
        - 2025
 - 
                        Mark
        In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Time-resolved ambient pressure x-ray photoelectron spectroscopy : Advancing the operando study of ALD chemistry
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Resolving active species during the carbon monoxide oxidation over Pt(111) on the microsecond timescale
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Catalysis in Frequency Space : Resolving Hidden Oscillating Minority Phases and Their Catalytic Properties
    
    
- Contribution to journal › Article
 
 - 2024
 - 
                        Mark
        In Vacuo XPS Study on Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and N2/NH3 Plasma
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Using Iron L-Edge and Nitrogen K-Edge X-ray Absorption Spectroscopy to Improve the Understanding of the Electronic Structure of Iron Carbene Complexes
    
    
- Contribution to journal › Article
 
 - 2023
 - 
                        Mark
        Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
    
    
- Contribution to journal › Article
 
 - 
                        Mark
        Time evolution of surface species during the ALD of high-k oxide on InAs
    
    
- Contribution to journal › Article
 
 
