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Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Kokkonen, E. LU orcid ; Nieminen, H. E. ; Rehman, F. LU ; Miikkulainen, V. ; Putkonen, M. ; Ritala, M. ; Huotari, Simo ; Schnadt, J. LU orcid and Urpelainen, S. LU (2024) In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 42(6).
Abstract

The initial adsorption of MeCpPtMe 3 is investigated using synchrotron-based ambient pressure x-ray photoelectron spectroscopy (XPS). The experiments are done on a native oxide-covered Si substrate. In addition, a reaction with O 2 and the created Pt surface was investigated. Inspiration for the reaction studies was found from atomic layer deposition of metallic Pt, process that uses the same compounds as precursors. With time-resolved XPS, we have been able to observe details of the deposition process and especially see chemical changes on the Pt atoms during the initial deposition of the Pt precursor. The change of the binding energy of the Pt 4f core level appears to occur on a different timescale than the growth of the active... (More)

The initial adsorption of MeCpPtMe 3 is investigated using synchrotron-based ambient pressure x-ray photoelectron spectroscopy (XPS). The experiments are done on a native oxide-covered Si substrate. In addition, a reaction with O 2 and the created Pt surface was investigated. Inspiration for the reaction studies was found from atomic layer deposition of metallic Pt, process that uses the same compounds as precursors. With time-resolved XPS, we have been able to observe details of the deposition process and especially see chemical changes on the Pt atoms during the initial deposition of the Pt precursor. The change of the binding energy of the Pt 4f core level appears to occur on a different timescale than the growth of the active surface sites. The very long pulse of the Pt precursor resulted in a metallic surface already from the beginning, which suggest chemical vapor deposition-like reactions occurring between the surface and the precursor molecules in this experiment. Additionally, based on the XPS data measured after the Pt precursor pulse, we can make suggestions for the reaction pathway, which point toward a scenario that leaves carbon from the MeCpPtMe 3 precursor on the surface. These carbon species are then efficiently removed by the subsequent coreactant pulse, leaving behind a mostly metallic Pt film.

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author
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organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
volume
42
issue
6
article number
062406
pages
8 pages
publisher
American Institute of Physics (AIP)
external identifiers
  • scopus:85209214504
ISSN
0734-2101
DOI
10.1116/6.0003871
language
English
LU publication?
yes
additional info
Publisher Copyright: © 2024 Author(s).
id
361a868b-e9ec-4565-b26f-606c4ee056b7
date added to LUP
2024-12-02 14:38:18
date last changed
2025-04-04 15:24:12
@article{361a868b-e9ec-4565-b26f-606c4ee056b7,
  abstract     = {{<p>The initial adsorption of MeCpPtMe 3 is investigated using synchrotron-based ambient pressure x-ray photoelectron spectroscopy (XPS). The experiments are done on a native oxide-covered Si substrate. In addition, a reaction with O 2 and the created Pt surface was investigated. Inspiration for the reaction studies was found from atomic layer deposition of metallic Pt, process that uses the same compounds as precursors. With time-resolved XPS, we have been able to observe details of the deposition process and especially see chemical changes on the Pt atoms during the initial deposition of the Pt precursor. The change of the binding energy of the Pt 4f core level appears to occur on a different timescale than the growth of the active surface sites. The very long pulse of the Pt precursor resulted in a metallic surface already from the beginning, which suggest chemical vapor deposition-like reactions occurring between the surface and the precursor molecules in this experiment. Additionally, based on the XPS data measured after the Pt precursor pulse, we can make suggestions for the reaction pathway, which point toward a scenario that leaves carbon from the MeCpPtMe 3 precursor on the surface. These carbon species are then efficiently removed by the subsequent coreactant pulse, leaving behind a mostly metallic Pt film.</p>}},
  author       = {{Kokkonen, E. and Nieminen, H. E. and Rehman, F. and Miikkulainen, V. and Putkonen, M. and Ritala, M. and Huotari, Simo and Schnadt, J. and Urpelainen, S.}},
  issn         = {{0734-2101}},
  language     = {{eng}},
  month        = {{10}},
  number       = {{6}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films}},
  title        = {{Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum}},
  url          = {{http://dx.doi.org/10.1116/6.0003871}},
  doi          = {{10.1116/6.0003871}},
  volume       = {{42}},
  year         = {{2024}},
}