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- 2025
-
Mark
Surface effects in quasiatomic layer etching of silicon
Danielsson, Oscar ; Karimi, Amin ; Ilarionova, Yoana ; Garnæs, Jørgen ; Khan, Sabbir A. and Maximov, Ivan LU
(2025)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
43(4).
- Contribution to journal › Article
- 2024
-
Mark
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD
Gogova, D. ; Tran, D. Q. ; Stanishev, V. ; Jokubavicius, V. ; Vines, L. ; Schubert, M. LU
; Yakimova, R.
; Paskov, P. P.
and Darakchieva, V.
LU
(2024)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
42(2).
- Contribution to journal › Article
-
Mark
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
Jones, Rosemary LU ; D’Acunto, Giulio LU ; Shayesteh, Payam LU ; Pinsard, Indiana ; Rochet, François ; Bournel, Fabrice ; Gallet, Jean Jacques ; Head, Ashley and Schnadt, Joachim LU
(2024)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
42(2).
- Contribution to journal › Article
-
Mark
In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry
Traouli, Yousra ; Kilic, Ufuk ; G. Kilic, Sema ; Hilfiker, Matthew ; Schmidt, Daniel ; Schoeche, Stefan ; Schubert, Eva and Schubert, Mathias LU
(2024)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
42(5).
- Contribution to journal › Article
-
Mark
Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
Kokkonen, E. LU
; Nieminen, H. E.
; Rehman, F.
LU
; Miikkulainen, V.
; Putkonen, M.
; Ritala, M.
; Huotari, Simo
; Schnadt, J.
LU
and Urpelainen, S.
LU
(2024)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
42(6).
- Contribution to journal › Article
- 2022
-
Mark
Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures
- Contribution to journal › Article
- 2018
-
Mark
In situ characterization of the deposition of anatase TiO2 on rutile TiO2(110)
Head, Ashley R. LU ; Johansson, Niclas LU ; Niu, Yuran LU ; Snezhkova, Olesia LU ; Chaudhary, Shilpi LU ; Schnadt, Joachim LU
; Bluhm, Hendrik
; Chen, Chaoyu
; Avila, José
and Asensio, Maria Carmen
(2018)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
36(2).
- Contribution to journal › Article
-
Mark
Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films
- Contribution to journal › Article
- 2017
-
Mark
Atomic layer etching of gallium nitride (0001)
Kauppinen, Christoffer ; Khan, Sabbir Ahmed ; Sundqvist, Jonas LU ; Suyatin, Dmitry B. LU
; Suihkonen, Sami
; Kauppinen, Esko I.
and Sopanen, Markku
(2017)
In Journal of Vacuum Science and Technology A
35(6).
- Contribution to journal › Article
-
Mark
Review Article : Recommended reading list of early publications on atomic layer deposition - Outcome of the "virtual Project on the History of ALD"
- Contribution to journal › Article