In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry
Traouli, Yousra ; Kilic, Ufuk ; G. Kilic, Sema ; Hilfiker, Matthew ; Schmidt, Daniel ; Schoeche, Stefan ; Schubert, Eva and Schubert, Mathias LU
(2024)
In Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
42(5).
- Abstract
We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model approach [Kilic et al., Sci. Rep. 10, 10392 (2020)] is used to analyze the spectroscopic data post-growth. With the help of this model, we explore the in-cycle surface modifications and reveal the repetitive layer-by-layer growth and surface roughness modification mechanisms during the ZnO ultrathin film deposition. The in situ complex-valued dielectric function of the amorphous ZnO thin film is also determined from the model analysis for photon energies of 1.7-4 eV. The dielectric function is analyzed using a critical point model approach... (More)
We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model approach [Kilic et al., Sci. Rep. 10, 10392 (2020)] is used to analyze the spectroscopic data post-growth. With the help of this model, we explore the in-cycle surface modifications and reveal the repetitive layer-by-layer growth and surface roughness modification mechanisms during the ZnO ultrathin film deposition. The in situ complex-valued dielectric function of the amorphous ZnO thin film is also determined from the model analysis for photon energies of 1.7-4 eV. The dielectric function is analyzed using a critical point model approach providing parameters for bandgap energy, amplitude, and broadening in addition to the index of refraction and extinction coefficient. The dynamic-dual-box-model analysis reveals the initial nucleation phase where the surface roughness changes due to nucleation and island growth prior to film coalescence, which then lead to the surface conformal layer-by-layer growth with constant surface roughness. The thickness evolution is resolved with Angstrom-scale resolution vs time. We propose this method for fast development of growth recipes from real-time in situ data analysis. We also present and discuss results from x-ray diffraction, x-ray photoelectron spectroscopy, and atomic force microscopy to examine crystallographic, chemical, and morphological characteristics of the ZnO film.
(Less)
- author
- Traouli, Yousra
; Kilic, Ufuk
; G. Kilic, Sema
; Hilfiker, Matthew
; Schmidt, Daniel
; Schoeche, Stefan
; Schubert, Eva
and Schubert, Mathias
LU
- organization
- publishing date
- 2024-09
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
- volume
- 42
- issue
- 5
- article number
- 052403
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- scopus:85203409751
- ISSN
- 0734-2101
- DOI
- 10.1116/6.0003830
- language
- English
- LU publication?
- yes
- id
- 2ede9fb0-5fb1-4bc0-be7a-9b19a4315431
- date added to LUP
- 2024-11-18 12:14:41
- date last changed
- 2025-04-04 14:19:24
@article{2ede9fb0-5fb1-4bc0-be7a-9b19a4315431,
abstract = {{<p>We investigate the time evolution of ZnO thin film growth in oxygen plasma-enhanced atomic layer deposition using in situ spectroscopic ellipsometry. The recently proposed dynamic-dual-box-model approach [Kilic et al., Sci. Rep. 10, 10392 (2020)] is used to analyze the spectroscopic data post-growth. With the help of this model, we explore the in-cycle surface modifications and reveal the repetitive layer-by-layer growth and surface roughness modification mechanisms during the ZnO ultrathin film deposition. The in situ complex-valued dielectric function of the amorphous ZnO thin film is also determined from the model analysis for photon energies of 1.7-4 eV. The dielectric function is analyzed using a critical point model approach providing parameters for bandgap energy, amplitude, and broadening in addition to the index of refraction and extinction coefficient. The dynamic-dual-box-model analysis reveals the initial nucleation phase where the surface roughness changes due to nucleation and island growth prior to film coalescence, which then lead to the surface conformal layer-by-layer growth with constant surface roughness. The thickness evolution is resolved with Angstrom-scale resolution vs time. We propose this method for fast development of growth recipes from real-time in situ data analysis. We also present and discuss results from x-ray diffraction, x-ray photoelectron spectroscopy, and atomic force microscopy to examine crystallographic, chemical, and morphological characteristics of the ZnO film.</p>}},
author = {{Traouli, Yousra and Kilic, Ufuk and G. Kilic, Sema and Hilfiker, Matthew and Schmidt, Daniel and Schoeche, Stefan and Schubert, Eva and Schubert, Mathias}},
issn = {{0734-2101}},
language = {{eng}},
number = {{5}},
publisher = {{American Institute of Physics (AIP)}},
series = {{Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films}},
title = {{In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry}},
url = {{http://dx.doi.org/10.1116/6.0003830}},
doi = {{10.1116/6.0003830}},
volume = {{42}},
year = {{2024}},
}