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- 2022
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Mark
Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
2022) In Chemistry of Materials(
- Contribution to journal › Article
- 2019
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Mark
Experimental and theoretical gas phase electronic structure study of tetrakis(dimethylamino) complexes of Ti(IV) and Hf(IV)
(
- Contribution to journal › Article
- 2016
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Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)
(
- Contribution to journal › Article
- 2015
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Mark
Real-Time Study of CVD Growth of Silicon Oxide on Rutile TiO2(110) Using Tetraethyl Orthosilicate
(
- Contribution to journal › Article