Joachim Schnadt
- Synchrotron Radiation Research
- Department of Physics
- NanoLund: Centre for Nanoscience
- eSSENCE: The e-Science Collaboration
- LTH Profile Area: Nanoscience and Semiconductor Technology
- LTH Profile Area: Photon Science and Technology
- LU Profile Area: Light and Materials
- MAX IV, APXPS
- MAX IV Laboratory
- MAX IV, Science division
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- 2025
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Mark
Time-resolved ambient pressure x-ray photoelectron spectroscopy : Advancing the operando study of ALD chemistry
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- Contribution to journal › Article
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In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
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- Contribution to journal › Article
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Mark
Catalysis in Frequency Space : Resolving Hidden Oscillating Minority Phases and Their Catalytic Properties
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- Contribution to journal › Article
- 2024
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Mark
In Vacuo XPS Study on Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and N2/NH3 Plasma
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- Contribution to journal › Article
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Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
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- Contribution to journal › Article
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Using Iron L-Edge and Nitrogen K-Edge X-ray Absorption Spectroscopy to Improve the Understanding of the Electronic Structure of Iron Carbene Complexes
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- Contribution to journal › Article
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Mark
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
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- Contribution to journal › Article
- 2023
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Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
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- Contribution to journal › Article
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Time evolution of surface species during the ALD of high-k oxide on InAs
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- Contribution to journal › Article
- 2022
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Mark
Following the Kinetics of Undercover Catalysis with APXPS and the Role of Hydrogen as an Intercalation Promoter
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- Contribution to journal › Article