MAX IV, APXPS
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- 2025
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Mark
In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
- Contribution to journal › Article
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Mark
Engineering 2D Materials from Single-Layer NbS2
- Contribution to journal › Article
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Mark
Hydroxylation of an ultrathin Co3O4(111) film on Ir(100) studied by in situ ambient pressure XPS and DFT
- Contribution to journal › Article
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Mark
Time-resolved ambient pressure x-ray photoelectron spectroscopy : Advancing the operando study of ALD chemistry
- Contribution to journal › Article
- 2024
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Mark
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
- Contribution to journal › Article
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Mark
Operando observation of the dynamic SEI formation on a carbonaceous electrode by near-ambient pressure XPS
- Contribution to journal › Article
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Mark
PEPICO analysis of catalytic reactor effluents towards quantitative isomer discrimination : DME conversion over a ZSM-5 zeolite
- Contribution to journal › Article
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Mark
The Bloch Beamline at MAX IV : Micro-Spot ARPES from a Conventional, Full-Featured Beamline
- Contribution to journal › Article
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Mark
Photoinduced charge transfer renormalization in NiO
- Contribution to journal › Article
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Mark
Growth and Redox Properties of Boron on Al(111) : Competing Affinities in the Case of Honeycomb AlB2
- Contribution to journal › Article
