Advanced

Spatial Structures Formed during High-Temperature Vacuum Annealing of Diamond-Like Film Deposited on a Silicon Substrate

Tsetlin, M. B.; Zakharov, Alexei LU ; Maslakov, K. I.; Mikheeva, M. N. and Lindau, I. (2009) In Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques 3(5). p.752-755
Abstract
The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the... (More)
The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the adjacent region at the following stage. (Less)
Please use this url to cite or link to this publication:
author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques
volume
3
issue
5
pages
752 - 755
publisher
MAIK Nauka/Interperiodica
external identifiers
  • wos:000270744900015
  • scopus:76349121029
ISSN
1027-4510
DOI
10.1134/S1027451009050152
language
English
LU publication?
yes
id
c41f4f68-4a36-4636-9768-993ec64c4075 (old id 1507332)
date added to LUP
2009-11-20 14:31:22
date last changed
2017-01-01 06:32:03
@article{c41f4f68-4a36-4636-9768-993ec64c4075,
  abstract     = {The process of an ultrahigh vacuum annealing of a diamond-like carbon film deposited on a silicon substrate has been studied in situ using a photoemission microscope mounted at the MAX-lab synchrotron's radiation source. After the annealing the film was examined ex situ using an atomic force microscope. It is revealed that the graphitization of the film occurs and round formations of several microns in size with a core of similar to 0.2 mu m in size appear on its surface at the temperature exceeding 1000 degrees C. Photoemission images of these formations have shown the presence of silicon on their surface. Apparently, the interaction between the carbon film and silicon substrate begins in the middle of the formation and spreads to the adjacent region at the following stage.},
  author       = {Tsetlin, M. B. and Zakharov, Alexei and Maslakov, K. I. and Mikheeva, M. N. and Lindau, I.},
  issn         = {1027-4510},
  language     = {eng},
  number       = {5},
  pages        = {752--755},
  publisher    = {MAIK Nauka/Interperiodica},
  series       = {Journal Of Surface Investigation-X-Ray Synchrotron And Neutron Techniques},
  title        = {Spatial Structures Formed during High-Temperature Vacuum Annealing of Diamond-Like Film Deposited on a Silicon Substrate},
  url          = {http://dx.doi.org/10.1134/S1027451009050152},
  volume       = {3},
  year         = {2009},
}