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Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Bilenberg, B; Hansen, M; Johansen, D; Ozkapici, V; Jeppesen, C; Szabo, P; Obieta, I M; Arroyo, O; Tegenfeldt, Jonas LU and Kristensen, A (2005) In Journal of Vacuum Science and Technology B 23(6). p.2944-2949
Abstract
We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are... (More)
We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed. (Less)
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology B
volume
23
issue
6
pages
2944 - 2949
publisher
American Institute of Physics
external identifiers
  • wos:000234613200129
  • scopus:29044433915
ISSN
1520-8567
DOI
10.1116/1.2091089
language
English
LU publication?
yes
id
59add5b3-3226-47b6-b47b-ae5539e9b34b (old id 209825)
date added to LUP
2007-09-17 19:40:08
date last changed
2017-08-20 03:39:10
@article{59add5b3-3226-47b6-b47b-ae5539e9b34b,
  abstract     = {We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.},
  author       = {Bilenberg, B and Hansen, M and Johansen, D and Ozkapici, V and Jeppesen, C and Szabo, P and Obieta, I M and Arroyo, O and Tegenfeldt, Jonas and Kristensen, A},
  issn         = {1520-8567},
  language     = {eng},
  number       = {6},
  pages        = {2944--2949},
  publisher    = {American Institute of Physics},
  series       = {Journal of Vacuum Science and Technology B},
  title        = {Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography},
  url          = {http://dx.doi.org/10.1116/1.2091089},
  volume       = {23},
  year         = {2005},
}