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Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Bilenberg, B ; Hansen, M ; Johansen, D ; Ozkapici, V ; Jeppesen, C ; Szabo, P ; Obieta, I M ; Arroyo, O ; Tegenfeldt, Jonas LU orcid and Kristensen, A (2005) In Journal of Vacuum Science and Technology B 23(6). p.2944-2949
Abstract
We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are... (More)
We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed. (Less)
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author
; ; ; ; ; ; ; ; and
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Journal of Vacuum Science and Technology B
volume
23
issue
6
pages
2944 - 2949
publisher
American Institute of Physics (AIP)
external identifiers
  • wos:000234613200129
  • scopus:29044433915
ISSN
1520-8567
DOI
10.1116/1.2091089
language
English
LU publication?
yes
id
59add5b3-3226-47b6-b47b-ae5539e9b34b (old id 209825)
date added to LUP
2016-04-01 12:07:52
date last changed
2022-04-13 06:32:42
@article{59add5b3-3226-47b6-b47b-ae5539e9b34b,
  abstract     = {{We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.}},
  author       = {{Bilenberg, B and Hansen, M and Johansen, D and Ozkapici, V and Jeppesen, C and Szabo, P and Obieta, I M and Arroyo, O and Tegenfeldt, Jonas and Kristensen, A}},
  issn         = {{1520-8567}},
  language     = {{eng}},
  number       = {{6}},
  pages        = {{2944--2949}},
  publisher    = {{American Institute of Physics (AIP)}},
  series       = {{Journal of Vacuum Science and Technology B}},
  title        = {{Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography}},
  url          = {{http://dx.doi.org/10.1116/1.2091089}},
  doi          = {{10.1116/1.2091089}},
  volume       = {{23}},
  year         = {{2005}},
}