Droplet-target laser-plasma source for proximity x-ray lithography
(1996) In Applied Physics Letters 68(19). p.2627-2629- Abstract
- A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.
Please use this url to cite or link to this publication:
https://lup.lub.lu.se/record/2258973
- author
- Malmqvist, Lennart LU ; Rymell, L and Hertz, H. M
- organization
- publishing date
- 1996
- type
- Contribution to journal
- publication status
- published
- subject
- in
- Applied Physics Letters
- volume
- 68
- issue
- 19
- pages
- 2627 - 2629
- publisher
- American Institute of Physics (AIP)
- external identifiers
-
- scopus:0030572086
- ISSN
- 0003-6951
- DOI
- 10.1063/1.116203
- language
- English
- LU publication?
- yes
- id
- 7f7d7ef3-ed81-40b7-ad9d-ee45d1904376 (old id 2258973)
- date added to LUP
- 2016-04-04 08:18:41
- date last changed
- 2022-02-05 23:49:12
@article{7f7d7ef3-ed81-40b7-ad9d-ee45d1904376, abstract = {{A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.}}, author = {{Malmqvist, Lennart and Rymell, L and Hertz, H. M}}, issn = {{0003-6951}}, language = {{eng}}, number = {{19}}, pages = {{2627--2629}}, publisher = {{American Institute of Physics (AIP)}}, series = {{Applied Physics Letters}}, title = {{Droplet-target laser-plasma source for proximity x-ray lithography}}, url = {{https://lup.lub.lu.se/search/files/5175667/2297445.pdf}}, doi = {{10.1063/1.116203}}, volume = {{68}}, year = {{1996}}, }