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Droplet-target laser-plasma source for proximity x-ray lithography

Malmqvist, Lennart LU ; Rymell, L and Hertz, H. M (1996) In Applied Physics Letters 68(19). p.2627-2629
Abstract
A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.
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author
organization
publishing date
type
Contribution to journal
publication status
published
subject
in
Applied Physics Letters
volume
68
issue
19
pages
2627 - 2629
publisher
American Institute of Physics
external identifiers
  • scopus:0030572086
ISSN
0003-6951
DOI
10.1063/1.116203
language
English
LU publication?
yes
id
7f7d7ef3-ed81-40b7-ad9d-ee45d1904376 (old id 2258973)
date added to LUP
2012-02-17 23:26:51
date last changed
2017-01-01 07:36:11
@article{7f7d7ef3-ed81-40b7-ad9d-ee45d1904376,
  abstract     = {A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from helium- and hydrogenlike fluorine in the 1.2-1.7 nm wavelength range was determined to similar to 2X10(12) photons/(sr-pulse). which corresponds to a conversion efficiency of similar to 5% of the 70 mJ laser pulse. Exposure of a copolymer of PMMA-MAA confirms the measured photon flux. Debris production was approximately 70 pg/sr pulse. The applicability of the source for dedicated lithography systems is discussed. (C) 1996 American Institute of Physics.},
  author       = {Malmqvist, Lennart and Rymell, L and Hertz, H. M},
  issn         = {0003-6951},
  language     = {eng},
  number       = {19},
  pages        = {2627--2629},
  publisher    = {American Institute of Physics},
  series       = {Applied Physics Letters},
  title        = {Droplet-target laser-plasma source for proximity x-ray lithography},
  url          = {http://dx.doi.org/10.1063/1.116203},
  volume       = {68},
  year         = {1996},
}